Materials Strategies for Advanced NanoTechnology
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1004-P06-08
Materials Strategies for Advanced NanoTechnology Kyung Choi Nanotechnology, Bell Labs., Lucent Technologies, 600-700 Mountain Ave, Murray Hill, NJ, 07974 We demonstrate ‘functional microfabrications’ by synthesizing new functional polymers. Photopatternable silicon elastomers have been designed for high fidelity, functional microfabrication purposes to integrate dynamic devices. ‘Elastic photopatterns’ generated by using molecularly modified silicon elastomers have been demonstrated since functional microfabrications are beneficial to develop elastic devices with high resolutions for our diverse applications.
INTRODUCTION Materials scientists and chemists have sought for the development of new materials and novel microfabrication techniques to fabricate high performance devices.1-7 We explored novel materials strategies to bring new advances in nanotechnology by developing functional polymers since nanotechnology is a part of chemical domain. We present novel chemistry here to modify conventional silicon elastomers thus to extend current nanotechnology to an advanced level for our diverse needs. There are many promising technologies in nanotechnology such as soft lithography, nanofabrications, functional pattern fabrications, and microfluidic technology. However, commercial materials, which were developed for other purposes, often show limitations for our specific purposes in nanotechnology. For this reason, we described here novel chemical approaches to overcome the limitations in conventional materials thus to achieve new advances in nanotechnology by developing new materials. Soft lithography has been widely used to transfer small patterns from the masters to substrates for integrating electronic patterns. Silicon elastomers are used for stamping or microprinting purposes in pattern transfers. Sylgard 184 commercially produced from Dow Corning, has been used in current soft lithography. However, those commercial silicon rubbers often result in mechanical failures such as collapses, mergences, and disconnections of features; especially, there are a lot of limitations for fabricating patterns at the nano-scale regimes using Sylgard 184. Since it is beneficial for us to modify chemical structures of commercial silicon rubbers, we introduced photopatternable silicon rubbers in this study to satisfy our multiple demands. To overcome the limitations, we designed and synthesized a new version of stamp materials. Silicon rubbers are based on poly(dimethyl)siloxane network. Its highly elastic property has been used for stamping and microfabrications.
Highly stretchable property of silicon elastomers is originated from the Si-O-Si structure combined with cross-linked structure. Figure 1 illustrates a comparison of molecular structures between conventional and designed photocurable PDMS prepolymers.
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Catalog #: Gelest, RMS-033
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