Mechanism-based design of precursors for focused electron beam-induced deposition
- PDF / 893,555 Bytes
- 15 Pages / 612 x 792 pts (letter) Page_size
- 91 Downloads / 182 Views
Prospective Article
Mechanism-based design of precursors for focused electron beam-induced deposition Will G. Carden, and Hang Lu, Department of Chemistry, University of Florida, Gainesville, Florida 32611-7200, USA Julie A. Spencer, Department of Chemistry, Johns Hopkins University, Baltimore, Maryland 21218-2685, USA; Department of Chemistry, United States Naval Academy, Annapolis, Maryland 21402, USA D. Howard Fairbrother, Department of Chemistry, Johns Hopkins University, Baltimore, Maryland 21218-2685, USA Lisa McElwee-White, Department of Chemistry, University of Florida, Gainesville, Florida 32611-7200, USA Address all correspondence to Lisa McElwee-White at [email protected]fl.edu (Received 22 February 2018; accepted 10 April 2018)
Abstract Focused electron beam-induced deposition (FEBID) is capable of producing metal-containing nanostructures with lateral resolution on the sub-nanometer scale. Practical application of this nanofabrication technique has been hindered by ligand-derived contamination from precursors developed for thermal deposition methods. Mechanistic insight into FEBID through surface science studies and gas-phase electron–molecule interactions has begun to enable the design of custom FEBID precursors. These studies have shown that precursors designed to decompose under electron irradiation can produce high-purity FEBID deposits. Herein, we highlight the progress in FEBID precursor development with several examples that incorporate this mechanism-based design approach.
Introduction Focused electron beam-induced deposition (FEBID) is a promising nanofabrication technique that can create metalcontaining nanostructures by using electrons to induce local decomposition of organometallic precursors adsorbed onto solid substrates in a vacuum environment.[1] The precursor molecules are physisorbed onto the surface under (local) steady-state conditions in dynamic equilibrium with the gas feed and serve as the reactant for the intended deposit. Deposition is initiated when secondary electrons created by the interaction of the primary electron beam with the substrate stimulate the decomposition of molecularly adsorbed precursor molecules into non-volatile fragments.[2–5] A representation of the FEBID process is depicted in Fig. 1. FEBID combines the advantages of direct-write lithographic processes (e.g., high spatial resolution, site specificity, maskless, resistless) with the flexibility to deposit materials on non-planar surfaces. The lateral dimensions of the deposits are controlled by rastering the electron beam, while the vertical dimensions are controlled by varying the dwell time at a specific location.[2–5] Consequently, FEBID has the capability to fabricate deposits where the size, shape, and interparticle distance can all be accurately and independently controlled across a range of length scales due to the relative ease with which electrons can be focused and translated. As such, a virtually unlimited range of spatially and geometrically well-defined three-dimensional (3D) metal-containing nanost
Data Loading...
