Morphological, Mechanical Property Analysis and Comparative Study over Structural Properties of CVD TiN Film Grown under
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ORIGINAL PAPER
Morphological, Mechanical Property Analysis and Comparative Study over Structural Properties of CVD TiN Film Grown under Different Substrate Temperature in Nitrogen Gas Atmosphere Soham Das 1 & Spandan Guha 2
&
Ranjan Ghadai 1 & Ashis Sharma 1 & Saikat Chatterjee 1
Received: 6 September 2020 / Accepted: 26 October 2020 # Springer Nature B.V. 2020
Abstract Titanium Nitride (TiN) thin films were deposited by thermal chemical vapor deposition process (CVD) over Si (100) substrate under different substrate temperatures. Morphological, mechanical, and structural properties were characterized by different techniques e.g. SEM, AFM, Nanoindentation and XRD. SEM images reveal the presence of agglomerated particles over the surface and AFM images reveal the enhancement of surface roughness with higher deposition temperature. The analysis of electrochemical polarization and electrochemical properties of TiN coatings reveals decrease in corrosion resistance with increase in process temperature. The nanoindentation analysis has confirmed that TiN coating possess maximum fracture toughness (KC), hardness (H), and Young’s modulus (Ef) when synthesized at the temperature of 1150 °C. For comparative study, an analysis over structural properties using different models e.g. UDM, UDEM, SSP etc. have been used in this study. The data analysis of TiN coatings are carried out by using Origin 9.0 software. Keywords CVD . TiN . SEM . AFM . XRD . Nanoindentation
1 Introduction The second-generation transition metal nitride coatings have been accepted worldwide due to their wide range of applications in machining industries and biomedical fields as these coatings possess good thermal, physical, mechanical, and tribological properties. Among the family of transition metal nitride coatings, TiN coated products exhibit higher nano hardness (H) wear resistance, corrosion resistance, and appreciable oxidation resistance [1]. The suitability of TiN as artificial implants had been explored by many researchers due to its higher erosion resistance and strong adhesion with the parent substrate [2, 3].
* Spandan Guha [email protected] 1
Department of Mechanical Engineering, Sikkim Manipal Institute of Technology, Sikkim Manipal University, Majitar, Rangpo-East Sikkim 737136, India
2
School of Mechanical Engineering, KIIT University, Bhubaneswar, Odisha 751024, India
The synthesis of TiN is generally carried out either through chemical route (CVD) or physical route (PVD). PVD techniques are generally known for their capability of producing smooth coatings with adequate compositional stoichiometry with uniform layer [4]. The various PVD techniques were used by various research groups for the deposition of TiN coatings e.g. sputtering, plasma nitriding, laser-assisted nitriding, and many more [1, 3, 5]. Thin-film deposition using the CVD technique mainly depends upon various reactant gases that are passed through the CVD heating chamber at fixed temperature and pressure. CVD coated thin film finds good surface uniformity and
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