Morphology and Microstructure of (111) Crystalline CeO 2 Films Grown on Amorphous SiO 2 Substrates by Pulsed-Laser Ablat
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D.P. Norton,a and R.J. Warmackb
a Solid State Division, MS-6056; b Health Sciences Research Division, Oak Ridge National Laboratory, P. 0. Box 2008, Oak Ridge, TN 37831-6056;
ABSTRACT The surface morphology and microstructure of (I 1 )-oriented CeO 2 thin films, grown on amorphous fused silica (NiO 2 ) substrates by low-energy-ion-beam assisted pulsed laser ablation, have been studied by atomic force microscopy (AFM) and x-ray diffraction (XRD). These CeO2 films are aligned with respect to a single in-plane axis despite being deposited on an amorphous substrate. There is a honeycomb-like growth morphology to the films and island-growth can be observed in thicker films. These islands, inside of which are high density of honeycomb-like clusters, are separated by a void network with -700nm width. However, on the surface of the thinnest film (-3am), only very small clusters (diameter
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