Morphology regulation of TiO 2 thin film by ALD growth temperature and its applications to encapsulation and light extra
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Morphology regulation of TiO2 thin film by ALD growth temperature and its applications to encapsulation and light extraction Xiaocong Lai1, Yalian Weng1, Guixiong Chen1, Sihua Que1, Xiongtu Zhou1,2,* , Qun Yan1,2, Chaoxing Wu1,2, Tailiang Guo1,2, Jie Sun1,2, and Yongai Zhang1,2,*
1 2
College of Physics and Information Engineering, Fuzhou University, Fuzhou 350116, Fujian, People’s Republic of China Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou 350116, Fujian, People’s Republic of China
Received: 1 September 2020
ABSTRACT
Accepted: 8 October 2020
As a multi-functional material, TiO2 thin film has been widely studied and applied in display, photocatalysis, solar cells and other fields. In this work, TiO2 thin films were prepared using atomic layer deposition, and their morphology was successfully regulated by the growth temperature. It was found that TiO2 film prepared at low temperature was amorphous, uniform and dense, with great barrier property, which can be used for encapsulation. Crystalline TiO2 nanoparticles with anatase phase appeared at higher temperature than 150 °C, whose amount increased with the growth temperature. The crystalline TiO2 particles can be used as templates to prepare randomly textured nano-patterns, which were proved to be able to improve the light extraction efficiency of photoelectric devices. Specifically, the luminance efficiency of the QLED with the nano-patterns formed by the crystalline TiO2 particle prepared at 200 °C and 250 °C were increased by 24.07% and 30.44%, respectively.
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Springer Science+Business
Media, LLC, part of Springer Nature 2020
1 Introduction Titanium dioxide (TiO2) has been widely used in microelectronics, encapsulation, sensors, optics, photocatalysis and other fields, such as a barrier in flexible display, an active layer in chemical sensors and electrochemical solar cells, a catalyst in photocatalytic purification technology, and a dielectric in
organic field effect transistors or other electronic devices [1–7]. In the applications of encapsulation and microelectronics, TiO2 films with high refractive index, flat, uniform, dense and controllable thickness are required. In the applications of catalysts, sensors as well as solar cells, where porosity, nanocrystalline structure and high surface-volume ratio of the active layer are preferred [8–10]. However, in many cases,
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https://doi.org/10.1007/s10854-020-04643-6
J Mater Sci: Mater Electron
the application of TiO2 was hindered by the uncontrollable coexistence of different structure types. Temperature has a great influence on the performance of TiO2 films, including the growth rate, uniformity, roughness, refractive index, the crystal structure and the transformation [11–14]. The controlled growth of amorphous and crystalline TiO2 films is a major problem that needs to be solved urgently. Therefore, deposition methods that can control the characteristics mentioned above
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