MRS 1997 Spring Meeting Takes Shape
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MRS 1997 Spring Meeting Takes Shape March 31-April 4
David J. Eaglesham Alex King Linda Griffith-Cima
The Materials Research Society's Spring Meeting of 1997 will take place from March 31 to April 4, at the San Francisco Marriott Hotel in San Francisco, California, chaired by David J. Eaglesham, Linda GriffithCima, and Alex King. Spring Meetings benefit, in the eyes of many attendees, from taking place in a single hotel allowing for ready movement from symposium to symposium and providing opportunity for the "hallway interactions" that are the intangible quality element of a great meeting. With these advantages in mind, along with a continuing commitment to capitalizing on the Meeting's proximity to Silicon Valley, the MRS 1997 Spring Meeting Chairs have put together a program of strongly interlinked symposia that includes recurring themes from previous meetings, along with several new components. This meeting will feature a special focus on manufacturing-related issues. New symposia are planned on subjects that include Point Defects in Silicon, Organic Electronic Materials and Devices, Multilevel Process Integration, Failure Mode Analysis, Wafer Cleaning in Integrated Circuit Manufacture, Thermoelectric Materials: New Directions and Approaches, Rapid Prototyping and Solid Freeform Manufacture, Structure-Directed Organic-Inorganic Hybrid Materials, and Metastability and Critical Phenomena in Polymer Systems. Many of these will link to ongoing symposia such as Amorphous and Nanocrystalline Silicon, Epitaxial Growth, Polycrystalline Thin Films, Materials Issues in Device Reliability,
High-Tc Superconductors, Flat-Panel Display Materials, and many others. Few of the materials researchers will find less than two or three symposia that they may want to attend, and the range from fundamental issues to manufacturing applications is particularly important in view of the current direction of U.S. governmental funding of materials research. The meeting will include the exhibit, plenary session, graduate student awards, poster sessions, and hot topics presented in Symposium X, plus several tutorials and perhaps even some special "April First" activities. A member of the technical staff in the Silicon Electronic Research Laboratory at Bell Laboratories, David J. Eaglesham works on the basic science underlying Si integrated circuit processing. He is recognized for innovative work combining transmission electron microscopy (TEM) and molecular beam epitaxy (MBE) to understand bulk diffusion in silicon, lowtemperature epitaxy, and other phenomena involving defects, surface energies, and crystal growth. He was the 1994 recipient of the MRS Outstanding Young Investigator Award, cited for "remarkable creativity, leadership, and experimental ingenuity in the discovery and understanding of fundamental interface, surface, and defect phenomena in semiconductor crystal growth" (see MRS Bulletin, March 1994, p. 84 and December 1994, p. 57). He received his BSc degree in chemical physics and his PhD degree in physics at the University of
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