Nano-Patterning of Graphene Structures Using Highly Focused Beams of Gallium Ions
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1259-S18-04
NANO-PATTERNING OF GRAPHENE STRUCTURES USING HIGHLY FOCUSED BEAMS OF GALLIUM IONS
Jacques Gierak*, Damien Lucot, Abdelkarim Ouerghi, Gilles Patriarche, Eric Bourhis, Giancarlo Faini, Dominique Mailly Laboratoire de Photonique et de Nanostructures Route de Nozay, F-91460 Marcoussis, France * Corresponding author Tel.: +33 169636075; Fax: +33 169636006. E-mail address: [email protected]
Abstract: Graphene is generating a considerable interest in materials science and condensedmatter physics. One crucial technological problem, that will govern future applicability of this material, is related to the patterning of graphene while preserving the exceptionally high crystallinity and electronic properties of this material. This article is aiming at demonstrating that a highly focused beam of gallium ions can be applied for sculpting ultra-thin and high quality suspended graphene nano-ribbons (GNRs).
I. INTRODUCTION There is now a solid consensus that alternative methods of structure fabrication, placement and organization within the sub 10 nm resolution gap, are urgently required to meet existing challenges in condensed matter, semiconductors and mesoscopic physics. Standard top-down methods such as resist-based lithography even used at the shortest available wavelengths have clearly identified limitations, while on the other hand bottom-up approaches like scanning probe manipulation techniques, remain challenging when trying to generate reproducible, functional and addressable nanostructures. Therefore at the laboratory level new routes must be explored. The patterning of samples using the FIB (FIB for Focused Ion Beam) technique is a very popular technique in many fields collectively related to nanoscience and nano-fabrication [1, 2]. This technology is especially important for prototyping devices and structural analysis. In this work we present and detail the advanced methodology and instrument we have carefully optimized for Focused Ion Beam processing of graphene sheets. Finally, we illustrated the high potential of this technique for graphene patterning at the nanoscale.
II. EXPERIMENTAL
1. A high resolution FIB patterning instrument. We have developed a FIB system having global specifications designed exclusively for nano-fabrication experiments [3] with a sub-5 nm ultimate resolution. This instrument has unique performances owing to: - The ion emitter. We use a Liquid Metal Ion Source that is a simple compact and quasiperfect point-type ion source. We have examined several kinds of ion sources and then decided to optimize a gallium Liquid Metal Ion Source. This optimization allowed us to obtain a record on-axis angular intensity (up to 80 µA/str), an extreme stability of the emission process (current variations less than 0.5 % per hour) [4]. At this stage long unattended nano-fabrication processes without the need of thermal heating cycles or source centering to recover adequate emission characteristics can be envisioned. This is a basic requirement in order to achieve nano-patterning app
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