Optical-Electrical Properties and Thickness Analysis of TiO 2 Thin Films Obtained by Magnetron Sputtering
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GENERAL AND APPLIED PHYSICS
Optical-Electrical Properties and Thickness Analysis of TiO2 Thin Films Obtained by Magnetron Sputtering ´ 3 V. S. S. Sobrinho1 · J. Q. M. Neto2 · L. L. F. Lima3 · I. A. Souza2 · M. S. Liborio 2 2 2 E. O. Almeida · M. C. Feitor · T. H. C. Costa
· J. C. A. Queiroz2 · R. R. M. Sousa4 ·
Received: 17 June 2020 / Accepted: 1 September 2020 © Sociedade Brasileira de F´ısica 2020
Abstract The study of thin films with properties that meet specific needs and improve people’s quality of life has been the focus of many researchers. However, knowing and controlling the production techniques of these films have been a challenge for the industry of optical-electronic devices, functional coatings, and energy conservation. The thickness of thin films is a parameter that influences the optical and electrical characteristics of these materials, thus being one of the most important information in the plasma deposition process. Because of the need for precision in measuring the thickness of thin transparent films, this work proposes to evaluate the Swanepoel methods (envelope) and the PUMA, computational method, from optical transmittance curves and compare them with the measurements directly made by microscopy. Scanning electronics for thin films of TiO2 deposited by magnetron sputtering in different conditions. The results of this study showed that the PUMA method is capable of calculating film thicknesses of a few hundred nanometers and with few interference fringes. The PUMA method showed convergence with high precision for films produced with 30 and 60 min of treatment and a difference of 17% for films with 120 min of deposition concerning the measurements made by microscopy. Keywords Thin films · Magnetron sputtering · Swanepoel method · PUMA · Transmittance
1 Introduction Industrial advances have increased interest in the development of thin films and new technologies based on nanomaterials that have resulted in a series of applications to improving people’s lives. Thus, the application of thin films extends to optical-electronic devices, functional coatings, and energy generation and conservation [1]. Works have been produced analyzing optically thin films of the most diverse materials and demonstrating the influence of the thickness of such films on their optical properties [1–5]. The optical analysis of thin films is for determining the optical and photocatalytic properties of the materials [6– 9], with the material thickness being deposited information necessary to obtain the absorption coefficient of the films and their Bandgap. Therefore, the use of accurate methods to obtain this measure is essential for the study of these materials. M. S. Lib´orio
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Extended author information available on the last page of the article.
Several techniques can be used to obtain the thickness of thin films: such as profilometry, ellipsometry, crosssectional SEM, and optical analysis [10, 11]. As optical analysis has the advantage of being a non-destructive method and depends on
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