Preview: 1990 MRS Fall Meeting
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d Processes" (Symposium T); "Advanced Tomographic Imaging Methods for the Analysis of Materials" (Symposium U); and "Nanostructures: Fabrication and Physics" (Symposium Y). A number of joint sessions and three major poster sessions will offer participants extended opportunities for interaction with their colleagues. Augmenting the opportunities for interaction are the equipment exhibit (a major show with 116 exhibitors) and a job placement center. The short course program, a regular feature at MRS meetings, will offer a sélection of 22 up-to-date specialty, review, and survey courses. (See p. 79 in this issue for a complète list, including seven new courses.) NASA Astronaut Bonnie Dunbar will deliver the plenary address Wednesday
evening, November 28 at the Boston Marriot Copley Place Hôtel. She will also receive the Presidential Award of the Materials Research Society from MRS Président Russell R. Chianelli in récognition of her contribution in raising public awareness of materials science. During the ceremony, Dunbar will return the MRS banner carried into space as part of Columbia's officiai flight kit. Other spécial events include the Von Hippel Award présentation, Graduate Student Awards ceremony, and the inaugural présentation of the MRS Medal Award. For détails about the meeting program and registration, see the 1990 MRS Fall Meeting Preliminary Program, which is mailed to ail MRS members. If you need a Preliminary Program, call MRS meetings registration at (412) 367-3003; FAX (412) 3674373.
Symposium A Surface Chemistry and Beam-Solid Interactions Monday-Thursday, November 26-29 Organizers: Harry Atwater, California Institute of Technology; Frances A. Houle,
IBM Almaden Research Center; and Doug Lowndes, Oak Ridge National Laboratory. Approximately 87 oral and 44 poster présentations will explore expérimental and theoretical issues related to the modification of surfaces and thin films by energetic
ion, photon, électron and fast molecular beams, including beam-induced chemical reactions and physical processes. Fundamental issues in physics, chemistry, and materials science of surface modification will be addressed, as well as applications in
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Preview: 1990 MRS Fall Meeting
the déposition, etching, patterning and modification of thin films. Topics include: fundamentals of beam-solid interactions and surface chemistry; laser-induced déposition and etching; laser ablation; reactive ion etching; focused beam patterning; ion beam, ion-beam-assisted, and neutral beam déposition; beam-induced crystallization and epitaxial growth; ion beam mixing and metastable phase formation; transient thermal processing; and in situ photon, électron and ion beam diagnostic techniques for surface modification. A joint session on beam-induced phase transformatio
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