Optimization of RF-Sputtered ITO Films for High NIR Transparency at Low Deposition Temperature

  • PDF / 199,779 Bytes
  • 6 Pages / 612 x 792 pts (letter) Page_size
  • 79 Downloads / 147 Views

DOWNLOAD

REPORT

F14.4.1

Optimization of RF-Sputtered ITO Films for High NIR Transparency at Low Deposition Temperature J. Zhou, X. Wu, T.A. Gessert, Y. Yan, G. Teeter, and H.R. Moutinho National Renewable Energy Laboratory, Golden, CO 80401 ABSTRACT Sn-doped indium oxide (ITO) films deposited at temperatures

Data Loading...

Recommend Documents
Plasma-assisted Atomic Layer Deposition of TiN Films at low Deposition Temperature for High-aspect Ratio Applications

199 94 322KB

Low temperature deposition of Indium tin oxide (ITO) films on plastic substrates

241 84 756KB

High-Temperature Electrical Insulation Behavior of Alumina Films Prepared at Room Temperature by Aerosol Deposition and

202 34 2MB

A Study of High Quality Al-doped ZnO Thin Films Grown at Low Temperature by Pulsed Laser Deposition

160 57 1MB

Low Temperature Transparent ITO-based Contacts for Mid-IR Applications

202 14 628KB

Growth of Polycrystalline Silicon Films at Low Temperature by Plasma Enhanced Chemical Vapor Deposition

210 104 1MB

Comparative Study of Annealed and High Temperature Grown ITO and AZO Films for Solar Energy Applications

156 14 1MB

High Quality a-Si:H Films Grown at High Deposition Rates

198 47 505KB

Microstructural Studies of L10-FePt Thin Films with High Coercivity Fabricated at Low Deposition Temperatures

202 99 209KB

Electrophoretic Deposition of High-Temperature Superconductor Thick Films

191 23 820KB

Guide for Low-Temperature and High-Rate Deposition of Device Quality Poly-Silicon Films By Cat-Cvd Method

153 108 323KB

ITO nanowires and nanoparticles for transparent films

193 41 591KB