Thermal Stability and Analysis of Laser Deposited Platinum Films
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t Department of Applied Physics and Electronic & Mechanical Engineering, University of Dundee, Dundee DD l 4HN, UK * Department of Chemistry, University of Dundee, Dundee DDI 41HN, UK § Central Laser Facility, Rutherford Appleton Laboratory, Chilton, Didcot, Oxfordshire
OXIl OQX, UK ABSTRACT As the trend towards device miniaturisation continues, surface effects and the thermal stability of metal deposits becomes increasingly important. We present here a study of the morphology and composition of platinum films, produced by the UV-induced decomposition of organometallic materials, under various annealing conditions. The surface composition of the metal deposits was studied by X-ray photoelectron spectroscopy, both as-deposited and following thermal treatment. In addition, the morphology of the surface was studied by atomic force microscopy which enabled the investigation of film restructuring. These studies were performed over a range of temperatures up to 1000°C in air and up to 600'C in reducing environments. Complementary information regarding the film morphology has been obtained from transmission electron microscopy. The data has been used to provide an insight into the effects of elevated temperatures on metal films deposited by a direct write method. INTRODUCTION Many studies have been made into the photolytic and pyrolytic decomposition of organometallic molecules in the gaseous [1], liquid [2] or solid phase [3-7]. We have developed a range of organometallic compounds which can be deposited as thin films by thermal evaporation [8,9]. This method of producing thin films has many advantages over alternative deposition methods such as spin coating. The absence of a solvent means that a film of high purity organometallic can be deposited onto a wide range of substrates including non-wettable or fragile membranes such as those used in X-ray lithography. The organometallic films exhibit excellent adhesion as a result of the absence of solvent molecules competing with the organometallic for bonding sites [10]. The films are then patterned through a standard chromium-on-quartz photomask using UV from an excimer laser. We present here a study of the composition and morphology of platinum films produced by the UV induced decomposition of organometallic films. UV deposited films were studied using Atomic Force Microscopy (AFM), Transmission Electron Microscopy (TEM) and X-Ray Photoelectron Spectroscopy (XPS) following various annealing regimes which involved heating the films in a range of reducing and oxidising environments at temperatures of up to 1000°C. Patterned organometallic films were also studied by Scanning Electron Microscopy (SEM) to investigate any changes in linewidth after heating the samples in both oxidising and reducing environments.
249 Mat. Res. Soc. Symp. Proc. Vol. 624 © 2000 Materials Research Society
EXPERIMENTAL DETAILS The organometallic compound used throughout this study was cis-Dichlorobis (triphenylphosphine) platinum(II). The substrates used included silicon wafers for SEM, AFM and X
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