Tribological Propertees of Carbon thin Films Prepared by Plasma-Free Sputtering Method
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TRIBOLOGICAL PROPERTIES OF CARBON THIN FILMS PREPARED BY PLASMA-FREE SPUTTERING METHOD T. Hirata and M. Naoe Dept. of Physical Electronics, Tokyo Institute of Technology, 2-12-1, O-okayama, Meguro-ku, Tokyo 152, Japan ABSTRACT Amorphous plasma-free
"Diamond-like"
substrates at low
Sputtering
(FTS)
determined
by tap,
carbon films
temperature
method.
by
Tribological
scratch and slide tests
were the
deposited Facing
on
Targets
characteristics
much better than those for amorphous carbon films deposited by the conventional Magnetron Sputtering (MS) method. Consequently, these films deposited
by the FTS
protective
rigid
layers in
method
magnetic
were
were surely useful for
disk.
INTRODUCTION Recently, of electronic
carbon films play important roles in devices [1]-[7].
On the other hand,
many kinds
they
are used as the protective layer with excellent wear resistance in rigid magnetic disks and exhibit good tribological characteristics in magnetic recording system. The deposition of carbon thin films in low working gas pressure is performed by cracking hydrocarbon gas in plasma[8] and bombarding graphite target by high-energy ions[9], i.e., sputtering. Usually,
the conventional MS
method is used for depositing the films deposited by the MS method revealed rough surface texture and clearly colu m nar microstructure by damaging and resputtering the growing film carbon
films.
However,
surface by high-energy
particles such as recoiled Ar atoms, negative ions and 7-electrons and by incorporating impurity gas into
the
film.
tribological rigid
Accordingly,
characteristics
magnetic disk. On the contrary,
they
did
not
applicable
the FTS
as
exhibit
satisfactory
protective
layer
in
method can deposit homogeneous
films with ultra-flat surface appearance and densely columnless morphology. In the FTS apparatus, the plasma of glow discharge can be
successfully
confined
in
the
space
between
Mat. Res. Soc. Symp. Proc. Vol. 239. 01992 Materials Research Society
the
facing
636
when the vertical magnetic field to the cathode strong enough to trap Y-electrons with high energy.
target planes plane is
Therefore, plasma-free
the apparatus can deposit good quality films on the substrates at high deposition rate. In addition to
these merits,
it
can control the structure and properties of
elements such as carbon by strict thin films of lighter adjustment of the biasing voltage Vb to substrate in the low range of several volts[10]. In this study, the specimen carbon films have been deposited by the FTS method and the tribological detail.
characteristics
of them
have
been
investigated
in
EXPERIMENT The FTS apparatus used in this study is shown in Fig.l. The used targets were two round plates of sintered graphite with diameter of 100 m m and thickness of 5 m m at the distance The distance between targets and substrates of 150 mm. dTT dTS was 75 a m. The magnetic field applied for confining the plasma was 180 G in the central point of the space between facing targets. Th
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