Reactive Sputter Deposition
The use of thin films is continuously expanding. In the family of Physical Vapour Deposition techniques, sputtering is one of the most important over the past 40 years. In this book, all aspects of the reactive magnetron sputtering process, from the
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SPRINGER SERIES IN MATERIALS SCIENCE 109
Reactive Sputter Deposition
Springer Series in
materials science
109
Springer Series in
materials science Editors: R. Hull
R. M. Osgood, Jr.
J. Parisi
H. Warlimont
The Springer Series in Materials Science covers the complete spectrum of materials physics, including fundamental principles, physical properties, materials theory and design. Recognizing the increasing importance of materials science in future device technologies, the book titles in this series ref lect the state-of-the-art in understanding and controlling the structure and properties of all important classes of materials. 99 Self-Organized Morphology in Nanostructured Materials Editors: K. Al-Shamery and J. Parisi
105 Dilute III-V Nitride Semiconductors and Material Systems Physics and Technology Editor: A. Erol
100 Self Healing Materials An Alternative Approach to 20 Centuries of Materials Science Editor: S. van der Zwaag
106 Into The Nano Era Moore’s Law Beyond Planar Silicon CMOS Editor: H.R. Huff
101 New Organic Nanostructures for Next Generation Devices Editors: K. Al-Shamery, H.-G. Rubahn, and H. Sitter
107 Organic Semiconductors in Sensor Applications Editors: D.A. Bernards, R.M. Ownes, and G.G. Malliaras
102 Photonic Crystal Fibers Properties and Applications By F. Poli, A. Cucinotta, and S. Selleri
108 Evolution of Thin-Film Morphology Modeling and Simulations By M. Pelliccione and T.-M. Lu
103 Polarons in Advanced Materials Editor: A.S. Alexandrov 104 Transparent Conductive Zinc Oxide Basics and Applications in Thin Film Solar Cells Editors: K. Ellmer, A. Klein, and B. Rech
109 Reactive Sputter Deposition Editors: D. Depla amd S. Mahieu 110 The Physics of Organic Superconductors and Conductors Editor: A. Lebed
Volumes 50–98 are listed at the end of the book.
D. Depla
S. Mahieu
Editors
Reactive Sputter Deposition With 341 Figures
123
Professor Dr. Diederik Depla Dr. Stijn Mahieu Gent University, Department of Solid-State Sciences 281-S1 Krijgslaan, 9000 Gent, Belgium E-mail: [email protected], [email protected]
Series Editors:
Professor Robert Hull
Professor Jürgen Parisi
University of Virginia Dept. of Materials Science and Engineering Thornton Hall Charlottesville, VA 22903-2442, USA
Universit¨at Oldenburg, Fachbereich Physik Abt. Energie- und Halbleiterforschung Carl-von-Ossietzky-Strasse 9–11 26129 Oldenburg, Germany
Professor R. M. Osgood, Jr.
Professor Hans Warlimont
Microelectronics Science Laboratory Department of Electrical Engineering Columbia University Seeley W. Mudd Building New York, NY 10027, USA
Institut f¨ur Festk¨orperund Werkstofforschung, Helmholtzstrasse 20 01069 Dresden, Germany
ISSN 0933-033X ISBN 978-3-540-76662-9 Springer Berlin Heidelberg New York Library of Congress Control Number: 2007938637 All rights reserved. No part of this book may be reproduced in any form, by photostat, microfilm, retrieval system, or any other means, without the written permission of Kodansha Ltd. (except in the case of brief quotation for critici
