Solution-based hafnium oxide thin films as potential antireflection coating for silicon solar cells
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Solution-based hafnium oxide thin films as potential antireflection coating for silicon solar cells Imran Kanmaz1, Al Montazer Mandong2, and Abdullah Uzum1,2,* 1 2
Faculty of Science, Department of Renewable Energy Resources/Technologies, Karadeniz Technical University, Trabzon, Turkey Faculty of Engineering, Department of Electrical and Electronics Engineering, Karadeniz Technical University, Trabzon, Turkey
Received: 30 June 2020
ABSTRACT
Accepted: 8 October 2020
Hafnium oxide (HfO2) thin films were formed by spin coating deposition and annealed in ambient air. Following the molarity optimization of hafnium content in the solution, effect of spin coating and thermal processes on the antireflection properties were analyzed. Characterizations were carried out by spectrophotometer, X-ray diffraction, spectroscopic ellipsometer and scanning electron microscopy measurements. Post deposition annealing temperatures range from 500 to 1000 C. Annealing led the crystallinity of the films above 500 C and possess monoclinic phase. Average reflectivity of 11.32% was achieved with 71.36 nm HfO2 film after annealing at 700 C. Ellipsometer measurements reveals refractive index of such a film as 1.934 at 600 nm. Average reflectance increases when annealing temperature is over 700 C mainly due to the increase of refractive index which is recorded as 2.05 after annealing at 800 C. Fresnel equations, transfer matrix method and PC1D simulations were carried out for reflectance spectra approximations. The experimental results and the theoretical data were relatively comparable. Spin coating HfO2 thin films are found promising as an antireflection layer for solar cells.
Springer Science+Business
Media, LLC, part of Springer Nature 2020
1 Introduction Solar cell industry is dominated by crystalline siliconbased solar cells where the highest confirmed efficiency for monocrystalline and multicrystalline are 26.7% and 22.3%, respectively [1]. Achieving high efficiencies with low cost is important to expand the use of solar energy based on photovoltaics. To establish high efficiencies of solar cells, scientists have been looking for various ways in utilizing the basic techniques to improve the efficiency of solar
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https://doi.org/10.1007/s10854-020-04640-9
cells. One of the most important part of the production of modern high- efficiency solar cell is the integration of antireflection coating (ARC). An ARC generally is a thin film layer of dielectric material deposited on illuminated surface of solar cell to reduce optical losses due to reflection and to increase transmittance of light, thus improving current generation and overall efficiency of solar cell. Silicon nitride (SiNx) is the most widely used antireflection coating in industrial level production of solar cells due to various advantages of it such as bulk and
J Mater Sci: Mater Electron
surface passivation properties and proven stability [2, 3]. Deposition of SiNx using plasma enhanced chemical vapor depositio
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