Synthesis and control of micro to noanscale porous structures of diamond like carbon films
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0954-H05-11
Synthesis and Control of Micro to Noanscale Porous Structures of Diamond like Carbon Films Peter Feng1,2, Ben Yang1, H. X. Zhang1, X. P. Wang1, Noel Upia1, G. Morella1,3, and B.R. Weinerd4 1 Physics Department, University of Puerto Rico, Ave. Ponce de leon, PO Box 23343, San Juan, 00931, Puerto Rico 2 Physics Department, Dong Hua University, Shanghai, 200052, China, People's Republic of 3 Department of Physical Sciences, University of Puerto Rico, P.O. Box 23343, PR 00931, San Juan, 00931, Puerto Rico 4 Chemistry Department, University of Puerto Rico, Ave. Ponce de leon, P.O. Box 23346, San Juan, 00931, Puerto Rico Abstract Diamond like carbon (DLC) films are synthesized on various substrates using a pulsed KrF excimer laser ablation deposition technique. Variations of laser power density, substrate temperature, angle and distance between the substrate and target yield different sizes of porous surfaces of DLC films. Microscope is used to examine the surfaces. Raman scattering is used to characterize the samples, and the typical G and D bands have been identified. Intensities and profiles of the G and D bands closely depend on laser power density. The relationship between the deposition rate and the power density is also studied. Keyword: pulsed laser beam, porous structure, diamond like carbon films
Introduction: Nanoscale porous carbon or diamond like carbon (DLC) films have attracted much interest due to their enormous potential applications on electrochemical hydrogen storage,[1] photovoltaic cells,[2] catalyst,[3] super-capacitors,[4] filters,[5,6] and other applications.[7] Many studies of porous DLC films have been conducted recently based on various techniques. However, during the last 10 years, main processing for synthesis of nano-porous carbon films are related to the template replication techniques,[8-10] lithography,[11] and oxygen gas plasma etching techniques.[12] Traditionally, lithographic techniques include several procedures such as surface preparation, photo mask generation, screen-printed thick film deposition, lithography, and chemical etching and cleaning.[13,14] As an alternative to conventional lithographic processes for nanofabrication over large areas, plasma etching techniques have been used. These techniques can overcome the disadvantages inherent in conventional lithographic techniques that use beam writing for the production of fine patterns, with low throughput and relatively high costs. Oxygen plasma etching techniques in processing of porous DLC film normally relies on usage of porous anodic alumina films for masking in the fabrication of nanohoneycomb structure of films. One of the critical aspects of the work is the availability of anodic porous aluminum film, which is an archetypal self-ordered nanochannel array material, in which the channels can exhibit extremely high aspect ratios.[15,16] Optionally, three-dimensionally ordered porous carbon surface can also be prepared using a close-packed array of silica colloidal crystals template.[10] However, all these proce
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