Tantalum and Niobium-Based Capacitors Science, Technology, and Appli
This book provides a comprehensive analysis of the science, technology, and applications of Tantalum and Niobium-based capacitors. The author discusses fundamentals, focusing on thermodynamic stability, major degradation processes and conduction mechanism
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Tantalum and Niobium-Based Capacitors Science, Technology, and Applications
Tantalum and Niobium-Based Capacitors
Yuri Freeman
Tantalum and Niobium-Based Capacitors Science, Technology, and Applications
Yuri Freeman Greer, SC, USA
ISBN 978-3-319-67869-6 ISBN 978-3-319-67870-2 (eBook) DOI 10.1007/978-3-319-67870-2 Library of Congress Control Number: 2017953008 © Springer International Publishing AG 2018 This work is subject to copyright. All rights are reserved by the Publisher, whether the whole or part of the material is concerned, specifically the rights of translation, reprinting, reuse of illustrations, recitation, broadcasting, reproduction on microfilms or in any other physical way, and transmission or information storage and retrieval, electronic adaptation, computer software, or by similar or dissimilar methodology now known or hereafter developed. The use of general descriptive names, registered names, trademarks, service marks, etc. in this publication does not imply, even in the absence of a specific statement, that such names are exempt from the relevant protective laws and regulations and therefore free for general use. The publisher, the authors and the editors are safe to assume that the advice and information in this book are believed to be true and accurate at the date of publication. Neither the publisher nor the authors or the editors give a warranty, express or implied, with respect to the material contained herein or for any errors or omissions that may have been made. The publisher remains neutral with regard to jurisdictional claims in published maps and institutional affiliations. Printed on acid-free paper This Springer imprint is published by Springer Nature The registered company is Springer International Publishing AG The registered company address is: Gewerbestrasse 11, 6330 Cham, Switzerland
To my wife, Galina, for all the good she brought into my life.
Acknowledgments
I would like to honor the memory of the great scientists whom I was privileged to work alongside in my career: Prof. Lev Palatnik from Kharkiv Polytechnic Institute; Dr. Ilia Skatkov from SCB ELITAN; Dr. Felix Zandman, founder of Vishay Intertechnology; and Dr. Brian Melody from KEMET Electronics. I would like to acknowledge Dr. Terry Tripp, whose papers and later collaboration encouraged my work in the field. I would like to thank my colleagues in the industry and academia who contributed to this book directly or through valuable conversations: KEMET’s Steve Hussey, Dr. Phil Lessner, Jonathan Paulsen, Tony Kinard, Dr. James Chen, George Haddox, Barry Reeves, Dr. Erik Reed, Dr. Javaid Qazi, Jeff Poltorak, Jim Fife, and David Jacobs; Clemson University’s Dr. Rod Harrell, Dr. Igor Luzinov, and Dr. Ruslan Burtovyy; and Tel Aviv University’s Dr. Alexander Gladkikh, Dr. Yuri Rozenberg, and Dr. Alexander Palevski. I would also like to acknowledge the engineers, technicians, and operators in the manufacturing, analytical, and electrical labs and mechanical shops who helped transform scientific ideas into advance
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