Template-assisted growth of nanowires using novel nanoporous films fabricated by inorganic nano phase separation
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Template-assisted growth of nanowires using novel nanoporous films fabricated by inorganic nano phase separation Kazuhiko Fukutani, Taiko Motoi and Tohru Den Leading-Edge Technology Development Headquarters, Canon Inc., 5-1, Morinosato-Wakamiya, Atsugi-shi, Kanagawa 243-0193, Japan ABSTRACT Ultrahigh pore density nanoporous films with a pore diameter of less than 10nm and a pore density exceeding 1016 pores/m2 were developed. Nano phase separation of a eutectic Al-Si system was used for the fabrication of these nanoporous films. Co-sputtered AlSi films form Al nano-cylinders, perpendicular to the substrate and parallel to each other, embedded in an amorphous Si matrix during film growth due to phase separation. Removal of the Al nano-cylinders from the co-sputtered AlSi films by chemical etching gives us ultrahigh pore density nanoporous films. The nanoporous films consist of mainly oxidized silicon. Depending on the film compositions and the film preparation conditions, such as RF power and the deposition temperature, the average pore diameter can be varied systematically from less than 5nm to 13nm with the pore density from 1015 to exceeding 1016 pores/m2. Furthermore we have demonstrated a template-assisted growth of ultrahigh-density Ni nanowire arrays with an aspect ratio of ~100 in the nanoporous films by electrodeposition. The fabrication method for nanowire arrays using the nanoporous films is quite simple and promising for the fabrication of nanostructured devices. INTRODUCTION 16
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Nanowire arrays, with a diameter of less than 10nm and a density exceeding 10 wires/m , are attractive for ultrahigh-density perpendicular magnetic recording media [1-3] and thermoelectric devices with a high thermoelectric figure of merit [4-6]. In order to fabricate nanowire arrays easily, template-assisted growth is a versatile and simple method. Various templates, such as diblock copolymer templates [7,8], track-etched membranes [9] and anodic alumina [9], have been already developed for the fabrication of nanowire arrays. However, it is 16 difficult to achieve a pore diameter of less than 10nm and a pore density exceeding 10 2 pores/m by these templates. Therefore, fabrication of the ultrahigh pore density nanoporous films for the template-assisted growth is a promising challenge. In the present study, we describe a novel processing method to fabricate ultrahigh pore density nanoporous films, based on a combination of nano-phase separation of an Al-Si system during the deposition and subsequent removal of Al by chemical etching. Furthermore, we demonstrate a template-assisted growth of ultrahigh-density Ni nanowire arrays by electrodeposition into the nanoporous films. This novel processing method offers a rapid fabrication of nanowires with wire diameters from less than 5 to 13nm and periods from less than 10 to 15nm that is likely to impact nanotechnology.
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EXPERIMENTAL DETAILS We produced the nanoporous templates for nanowire arrays using phase separated AlSi films, composed of Al nano-cylinders su
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