The Experimental Study of Novel Pseudospark Hollow Cathode Plasma Electron Gun
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The Experimental Study of Novel Pseudospark Hollow Cathode Plasma Electron Gun Xiaowei Gu & Lin Meng & Yiqin Sun & Xinhua Yu
Received: 7 April 2008 / Accepted: 22 July 2008 / Published online: 5 August 2008 # Springer Science + Business Media, LLC 2008
Abstract The high-power microwave devices with plasma-filled have unique properties. One of the major problems associated with plasma-filled microwave sources is that ions from the plasma drift toward the gun regions of the tube. This bombardment is particularly dangerous for the gun, where high-energy ion impacts can damage the cathode surface and degrade its electron emission capabilities. One of the techniques investigated to mitigate this issue is to replace the material cathode with plasma cathode. Now, we study the novel electron gun (E-gun) that can be suitable for high power microwave device applications, adopting two forms of discharge channel, 1: a single hole channel, the structure can produce a solid electron beam; 2: porous holes channel, the structure can generate multiple electronic injection which is similar to the annular electron beam. Keywords Pseudospark discharge . Pseudospark plasma electron gun . Electron beams
1 Introduction A Pseudospark discharge is a low gas pressure discharge in a hollow cathode and a planar anode configuration. The characteristic breakdown curve is operated on the low pressure side of the Paschen curve. Highly pinched electron beams with high current densities have been observed to exit the discharge on-axis during the breakdown phase. Interest in these high-quality, high-current electron beams has been stimulated by their potential applications in such diverse areas as electron-beam lithography and plasma processing. Moreover, the high-power microwave tube community would welcome the development of highbrightness beam sources, especially if total beam current and energy could approach that currently achieved in high-power pulse-line accelerators. The recent year’s research indicated that the plasma can be used to assist E-Beam propagate through the microwaveelectron interaction regions [1]. And it can acquire the higher device efficiency by X. Gu (*) : L. Meng : Y. Sun : X. Yu School of Physics Electronics, University of Electronic Science and Technology of China, Chengdu, China 610054 e-mail: [email protected]
Int J Infrared Milli Waves (2008) 29:1032–1037
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approving the coupling between electron beam and electromagnetic structure. One of the major problems associated with plasma-filled microwave sources is that high-energy ion impacts can damage the cathode surface and degrade its electron emission capabilities. One of the techniques investigated to mitigate this issue is to replace the material cathode with plasma cathode. In this condition, the plasma is generated in the closure cavity and the electron is extracted from some boundary of the plasma and accelerated to form the Ebeam. Physically, the electron is emitted from the flashover plasma on the surface of cathode, although the plasma density is sig
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