The Reaction of NH 3 with TiN: Implications for CVD
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453 Mat. Res. Soc. Symp. Proc. Vol. 410 © 1996 Materials Research Society
EXPERIMENTAL TECHNIQUE The experiments were performed in a stainless-steel UHV chamber that has been described previously,' modified such that the chamber housing the mass spectrometer was pumped by a turbomolecular pump rather than by an ion pump. The TiN films (Goodfellow Corp.) were sputterdeposited 2-3 ýtm thick on 8-mm-diameter Ti disks. Auger electron spectroscopy (AES) showed that C and 0 were the main contaminants, with typical C/Ti and O/Ti atomic ratios of
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