X-ray Microprobe Studies of Materials Problems Related to Microelectromechanical Systems (MEMS) Structures
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PROBLEMS RELATED TO
MICROELECTROMECHAMICAL SYSTEMS (MEMS) STRUCTURES
N. MOLDERSa, P.J. SCHILLINGb, J. GO)TTERTc, H.O. MOSERC and V. SAILEd a Center for Advanced Microstructures and Devices, Louisiana State University, Baton
Rouge, LA 70806, [email protected] b Department of Mechanical Engineering, University of New Orleans (UNO), New
Orleans, LA 70148, USA Group ANKA, Forschungszentrum Karlsruhe, Germany d Institut of Microstructure Technology, Forschungszentrum Karlsruhe, Germany ABSTRACT The understanding of the physical, chemical and mechanical properties of materials used in micro-electromechanical systems (MEMS) is essential for the successful application. For the characterization of such materials, it is often necessary to utilize a probe which can gather information on the same scale as the devices themselves. Based on these needs, x-ray microprobe analysis has been employed to perform spatially resolved measurements on several problems related to the fabrication of MEMS devices. These include spatially resolved transmission measurements of the homogeneity of transmitted flux through a graphite mask, micro-fluorescence measurements to assess elemental distributions, and micro-XANES measurements to follow the breakdown of new sulfone-based x-ray resists. These studies demonstrate the value of such an instrument in the characterization of micro-systems. INTRODUCTION The understanding of the physical, chemical and mechanical properties of materials used in the micro-environment is essential for the successful performance of MEMS components. Previous investigations of such materials at the Center for Advanced Microstructures and Device (CAMD), Louisiana State University, included the nondestructive characterization of various electroplated Permalloy foils and other alloys used in the LIGA process, by x-ray absorption spectroscopy presenting the local structural analysis and thickness/density measurements (1). However, these studies were limited to a scale of a few millimeters. Recently at CAMD, we developed a new tool, which can non-destructively characterize materials via x-ray absorption spectroscopy and x-ray fluorescence analysis on a microscopic scale of 20 jim x 7.0 jim (2). This new tool has been used to study various materials problems related to the production of MEMS devices. In this paper, we will show spatially-resolved x-ray transmission measurements of the graphite substrate of an x-ray mask indicating the transmission fluctuations due to high-Z trace elements. Furthermore, the characterization as well as the spatial location of radiation-induced production of sulfur functional groups in a new potential x-ray resist indicative of the dose deposition.
261 Mat. Res. Soc. Symp. Proc. Vol. 605 © 2000 Materials Research Society
EXPERIMENTAL SET-UP To investigate the graphite substrate and the PHS resist, we place the samples on a sample stage assembly of the CAMD x-ray microprobe beamline. The microprobe uses a Kirkpatrick-Baez mirror focusing system (3) and can either operate using focused polychr
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