A Near-Field Microwave Probe for Quantitative Characterization of Dielectric Thin Films
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O11.10.1
A Near-Field Microwave Probe for Quantitative Characterization of Dielectric Thin Films Vladimir V. Talanov, Robert L. Moreland, André Scherz, Bin Ming, and Andrew R. Schwartz Neocera, Inc., 10000 Virginia Manor Road, Beltsville, MD 20705 USA ABSTRACT We have developed a novel scanning near-field microwave probe capable of precise quantitative measurements of dielectric constant of thin dielectric films. The technique is noncontact and has a few-micron sampling spot-size. For dielectric films with k
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