Arrays of Size-Selected Metal Nanoparticles Formed by Cluster Ion Beam Technique
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MRS Advances © 2018 Materials Research Society DOI: 10.1557/adv.2018.427
Arrays of Size-Selected Metal Nanoparticles Formed by Cluster Ion Beam Technique Florian A. Ceynowa1,2, Manohar Chirumamilla1, Vladimir A. Zenin3 and Vladimir N. Popok1 1
Aalborg University, 9220 Aalborg, Denmark
2
Kiel University, 24098 Kiel, Germany
3
University of Southern Denmark, 5230 Odense, Denmark
ABSTRACT
Deposition of size-selected copper and silver nanoparticles (NPs) on polymers using cluster beam technique is studied. It is shown that ratio of particle embedment in the film can be controlled by simple thermal annealing. Combining electron beam lithography, cluster beam deposition, and heat treatment allows to form specific patterns (arrays) of metal NPs on polymer films. Plasticity and flexibility of polymer host and specific properties added by coinage metal NPs open a way for different applications of such composite materials, in particular, for the formation of plasmonic structures with required configurations which can be applied for wave-guiding, resonators, in sensor technologies, and surface enhanced Raman scattering.
INTRODUCTION Light interaction with metal nanoparticles (NPs) gives rise to a number of fascinating optical phenomena. One of the directions of research is the search for configurations that utilize localized plasmon resonances and enable to amplify the local electromagnetic fields produced by NP assembling or forming specific spatial architectures. Therefore, there is a strong interest in the formation of NP arrays for practical applications in nanoscale optics, surface enhanced Raman spectroscopy, and optical sensing [1-4]. There are various possibilities to produce NP assemblies or arrays. For example, gluing of gold NPs by cucurbit[n]uril provides rigid interparticle separation [5]. In another approach, the NPs are chemically bound into grooves produced by lithography [2]. The bounding can be also achieved by modulating the spatial electrostatic potential [6]. There are approaches utilizing cluster beam deposition through stencil masks [7]. Most of the methods involve polymer materials either at intermediate production stages (for example, under lithography) or in final sample configuration because polymer materials as plastic and flexible hosts provide a number of practical advantages.
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Therefore, the behavior of metal NPs on polymer surfaces under different treatment regimes is also of high practical interest. In the current paper, size-selected Cu and Ag NPs are deposited on the polymer films from cluster beams. NP behavior under thermal annealing is studied in order to control the degree of particle embedment in the films. By combining cluster deposition and electron beam lithography (EBL), designed patterns (arrays) of NPs are obtained showing a way to
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