Carbon and Oxygen Incorporations into Surface Layers During Titanium Implantation
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CARBON AND OXYGEN INCORPORATIONS TITANIUM IMPLANTATION
INTO SURFACE LAYERS
DURING
Y. FUKUI , Y. HIROSE* AND M. IWAKI *Hanshin Research and Development Laboratories, Nisshin Steel Co., Ltd., 5 Ishizunishi-machi, Sakai, Osaka, 592, Japan **The Institute of Physical and Chemical Research(RIKEN), 2-1 Hirosawa, Wako, Saitama, 351-01, Japan
ABSTRACT A study has been made of incorporations of carbon and oxygen into surfaces of fourteen kinds of specimens during titanium implantation by means of AES sputter depth profiling. The specimens used were Fe, Al, Cu, Si, Cr, Ta, Co, Ni', Mo, Ti, Au, Pt, Pd and Fe-4.5at%C, which were implanted with titanium to a fluence of 2X10 1 7 ions/cm2 in a vacuum of _2X10-4 Pa at room temperature. The fourteen kinds of specimens implanted with titanium were classified into three groups according to the amounts of incorporated carbon and oxygen from a vacuum to the surfaces. The first group corresponds to Fe, Ni, Co, Al and Fe-4.5at%C, in which surfaces a large amount of carbon is incorporated. The second group corresponds to Al, Ti and Ta, in which surfaces a large amount of oxygen is incorporated. The third group corresponds to Cu, Si, Cr, Mo, Au, Pt and Pd, in which surfaces carbon and oxygen are little incorporated. In the cases of Cu, Au, Pt and Pd, little incorporations of carbon and oxygen are caused by the high sputtering yield and the less adsorptive power of the specimens.
INTRODUCTION Modification at surfaces of metal and ceramics by ion implantation needs high fluences of ions as compared with implantation to semiconductor. In the case of implantation with high fluences it becomes a problem that elements of residual gases in a target vacuum chamber are incorporated into surface layers of specimens during implantation [1,2,3]. It is not a problem in the case of low fluence implantation because carbon and oxygen are little incorporated. It has been reported that incorporated carbon and oxygen which are main elements in residual gases change mechanical [4], electrical [5] and electrochemical [6] properties in the implanted surface. The incorporated carbon and oxygen from a vacuum which influence surface properties of the specimens has not been investigated. In this report the incorporations of carbon and oxygen into the surfaces of fourteen kinds of specimens during implantation were investigated by titanium implantation.
Mat. Res. Soc. Symp. Proc. Vol. 100. c1958 Materials Research Society
192
EXPERIMENT Specimens used were Fe, Al, Cu, Si, Cr, Ta, Co, Ni, Mo, Ti, They Au, Pt and Pd with purities above 99.9% and Fe-4.5at%C. were cleaned with ethanol and acetone after electro-polishing for Fe, Al and Cu, chemical polishing for Si, mechanical polishing with submicron particles for Cr, Mo, Ti, Cr, Mo and Fe7 Pa for 4.5at%C and 4 keV Ar-ion etching in a vacuum below 2X10The specimens were implanted with a 150 keY Au, Pt, Pd and Ta. 2 2 17 ions/cm (-0.5pA/cm ) at room Ti-ion beam to a fluence of 2X10 The target chamber was evacuated by a turbotemperature. 4 Pa. Constituents of res
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