Chemical Treatment Influence on the Glass Substrate to the Growth of V 2 O 5 /PANI Thin Film
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1230-MM06-07
Chemical Treatment Influence on the Glass Substrate to the Growth of V2O5/PANI Thin Film
Elidia M. Guerra1*, Mirela C. Santos2, Rodrigo F. Bianchi2 1
Universidade Federal de São João Del Rei, CAP, Ouro Branco-MG, Brazil
2
Departamento de Física, ICEB, Universidade Federal de Ouro Preto, Morro do Cruzeiro
s/n, Ouro Preto (MG), Brazil
*
Corresponding author: Fax: +5531 3741 3280, e-mail address: [email protected]
ABSTRACT Growth of the vanadium pentoxide xerogel in the presence of the polyaniline thin film (V2O5/PANI) in different chemical treatment on substrate are presented. The in situ characterization studies revealed the presence of a lamellar structure for the V2O5/PANI hybrid material. The intercalation reaction was evidenced on the basis of the increase in the d-spacing as well as the displacement of the absorption bands toward lower energy levels. The growth of V2O5/PANI thin film, from direct reaction, on glasses substrate using pre-treated with cationic surfactant cetyl pyridinium chloride (CPC) and cetyl trimethylammonium bromide (CTAB) presented layers with a surface homogeneous. The UV/ozone and RCA treatment showed that the film had low adhesion on substrate compared with CPC and CTAB treatment. Furthermore, these results suggests that the CTAB and CPC treatment can be used, further, for V2O5/PANI LbL films using V2O5 gel as first layer as well as a promising candidate for applications as sensor for ammonia detection in poultry shed. INTRODUCTION Control at the film thickness is the key factor for developing novel materials with enhanced properties which is relevant due to many applications including sensors and electrochromic devices that may require organized molecular structures, with low roughness and high electric conductivity [1]. In general, the material is laid up onto a substrate surface and the deposition can be performed using several techniques forming, as result, a thin layer. The simplest technique to prepare thin films is spin-coating or casting [2]. Casting allows the fabrication of films with thickness of few micrometer but the thickness, roughness, and structural organization are not well controlled. The LbL technique is a simple technique for deposition of films with thickness of the order of a few nanometers, with alternated layers of different materials, but the production of
thicker films is tedious and time consuming. [3]. For this fabrication, the techniques rely upon adhesion of a (sub) monolayer of active species onto a substrate, followed by surface reaction using an oxygen bound species in the case of oxide deposition, and hydrogen in the case of metal deposition. This process can be repeated as many times as necessary to deposit the required thickness [4]. In addition, the film adhesion occurrence onto the substrate needs a previous treatment named cleaning technique. Several cleaning techniques can modify the physico-chemical properties of substrate surface for improve the adhesion interfacial between two dissimilar phases, without affecting the proper
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