Chemical Vapor Cleaning of Sodium from SiO 2
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CHEMICAl. VAPOR CLEANING OF SODIUM FROM SiO 2 DAVID A. BOHLING, BRIAN S. FELKER, AND MARK A. GEORGE Electronic Materials and Applications R&D, Electronics Division, Air Products and Chemicals, Inc., 7201 Hamilton Blvd., Allentown, PA 18195,
USA.
ABSTRACT Chemical vapor cleaning (CVC) is an emerging technology which has been used to remove transition metal contamination from wafer surfaces. CVC is a gas phase/surface reaction which does not incorporate any wet steps nor condensation of reagents onto the wafer surface. In previous work, we reported the effective removal of trace iron and copper from native oxide surfaces using 1,1,1,5,5,5-hexafluoro-2,4-pentanedione (HFAC) and other chelating or coordination compounds. In general, surface metal contaminants form volatile reaction products with these CVC reagents at relatively low temperatures (
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