Crystallinity and Wet Etch Behavior of HfO 2 Films Grown by MOCVD

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Crystallinity and Wet Etch Behavior of HfO2 Films Grown by MOCVD Katherine L. Saenger1, Cyril Cabral, Jr.1, Paul C. Jamison1, Edward Preisler1, and Andrew J. Kellock2 1 IBM Semiconductor R & D Center, IBM T.J. Watson Research Center, Yorktown Heights, NY; 2 IBM Almaden Research Center, San Jose, CA. ABSTRACT The crystallinity and wet etching behaviors of ultrathin (

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