Design for Manufacturability with Advanced Lithography
This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies
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Design for Manufacturability with Advanced Lithography
Design for Manufacturability with Advanced Lithography
Bei Yu • David Z. Pan
Design for Manufacturability with Advanced Lithography
123
Bei Yu ECE Department The University of Texas Austin, TX, USA
David Z. Pan ECE Department The University of Texas Austin, TX, USA
ISBN 978-3-319-20384-3 ISBN 978-3-319-20385-0 (eBook) DOI 10.1007/978-3-319-20385-0 Library of Congress Control Number: 2015949238 Springer Cham Heidelberg New York Dordrecht London © Springer International Publishing Switzerland 2016 This work is subject to copyright. All rights are reserved by the Publisher, whether the whole or part of the material is concerned, specifically the rights of translation, reprinting, reuse of illustrations, recitation, broadcasting, reproduction on microfilms or in any other physical way, and transmission or information storage and retrieval, electronic adaptation, computer software, or by similar or dissimilar methodology now known or hereafter developed. The use of general descriptive names, registered names, trademarks, service marks, etc. in this publication does not imply, even in the absence of a specific statement, that such names are exempt from the relevant protective laws and regulations and therefore free for general use. The publisher, the authors and the editors are safe to assume that the advice and information in this book are believed to be true and accurate at the date of publication. Neither the publisher nor the authors or the editors give a warranty, express or implied, with respect to the material contained herein or for any errors or omissions that may have been made. Printed on acid-free paper Springer International Publishing AG Switzerland is part of Springer Science+Business Media (www. springer.com)
To Le and Mandy Bei
To Shaoling and Jeffrey David
Preface
Shrinking the feature size of very large-scale integrated circuits (VLSI) with advanced lithography has been a holy grail for the semiconductor industry. However, the gap between manufacturing capability and the expectation of design performance becomes critically challenged in sub-28 nm technology nodes. To bridge this gap, design for manufacturability (DFM) is a must to co-optimize both design and lithography process at the same time. In this book, we have aimed to present the most state-of-the-art research results on DFM with multiple patterning lithography (MPL) and electron beam lithography (EBL). Note that we have made no attempt to include everything, or even everything which is important in DFM. For example, design challenges toward extreme ultraviolet (EUV), directed self-assembly (DSA), and nanoimprint lithography (NIL) are not covered in this book. We hope this book will function as a concise introduction and demonstration on the design and technology cooptimization. DFM for advanced lithography could be defined very differently under different circumstances. In general, progress in advanced lithography happens along three different directions: • New patterning te
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