E-MRS 1996 Spring Meeting to Take Place in Strasbourg in June
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E-MRS1996 Spring Meeting to Take Place in Strasbourg in June E-MRS (European Materials Research Society) 1996 Spring Meeting is scheduled for June 4-7, 1996 at Congress Center, Palais de la Musique et des Congres, Strasbourg, France. The conference program includes 12 symposia and two round-tables. Symposium A, High-Temperature Electronics: Materials, Devices, and Applications, will review recent progress that has been made in the development of new materials and device technologies. Symposium B, ThinFilm Materials for Large Area Electronics,
will emphasize poly- and microcrystalline silicon for thin-film transistors (TFTs), and other materials and processes related to TFTs, displays, and sensors. Symposium C on UV, Blue and Green Light Emission from Semiconductor Materials will bring together crystal growers, chemists, physicists, and device scientists working in II-VI (ZnSe-based structures), III-V (GaN-based devices), and frequency doubling devices in order to discuss the problems dealing with the development of visible optoelectronic devices. Group IV Heterostructures, Physics, and Devices (Si, Ge, C, cx-Sn), the topic of Symposium D, will give particular attention to recent achievements using CVD techniques as well as to the physics of novel structures and devices in general. Magnetic Ultra Thin Films, Multilayers, and Surfaces, Symposium E, will address the theories, experiments, and techniques for the investigations and understanding of the behavior of magnetic surfaces, interfaces, and nanostructures now extended beyond metallic multilayers to novel lowdimensional structures such as nanowires, magnetic dots, and spin injection structures. Fundamental aspects of high-temperature
superconductor thin-film growth methods; growth mechanisms; defect generation and their relation to the quality of films, heterostructures, and interfaces comprise the focus of Symposium F, High-Temperature Superconductor Thin Films: Growth Mechanisms, Interfaces, Multilayers. This symposium will feature a special session on "MOCVD of High-Temperature Superconductors and Related Oxide Thin Films." Symposium G on Nonlinear Optical and Optoelectronic Organic Materials will cover the areas of materials synthesis and processing; characterization of electronic structure and nonlinear and optoelectronic responses; and device design, fabrication, and testing. Laser Processing of Surfaces and Thin Films, Symposium H, will particularly emphasize surface modification with pico- and femtosecond laser pulses, deposition of thin films, cluster production, nanostructure manufacturing, surface cleaning, analysis of surfaces and multilayers, and the development of in situ analytical techniques. New trends in ion beam processing of semiconductors and the current challenges faced by microelectronic device manufacturing make up the particular emphasis of Symposium I on New Trends in Ion Beam Processing of Materials. Symposium J on Advanced Materials for Interconnections will focus on the deposition, processing, and characterization of low-resistivity
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