Growth and Properties of Ceramic thin Films Processed by In-Situ Laser Deposition Technique
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GROWTH AND PROPERTIES OF CERAMIC THIN FILMS PROCESSED BY IN-SITU LASER DEPOSITION TECHNIQUE S.M.Kanetkar*, S.Sharan, P.Tiwari, J.Matera and J.Narayan,Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC-27695-7916 * On leave from Department of Physics, University of Poona, Pune-411007, INDIA. ABSTRACT Good quality ceramic thin films of yttria-stabilized zirconia (YSZ), MgO, BN and TiN were grown on single crystal silicon with (100) orientation using in-situ pulsed laser physical vapor deposition (LPVD) technique.Laser deposition parameters were optimized and the resulting thin films were characterized by X-ray diffraction ,Rutherford backscattering spectrometry and transmission electron microscopy (plan and cross section). All the films were found to be polycrystalline with a texture. The absence of interfacial reaction and smooth interface on the atomic scale are the main features observed in these oxides and nitrides thin films on Si (100) substrate. INTRODUCTION Ceramic coatings are known to be important due to their numerous applications. Since, ceramics are a distinct class of materials having excellent electronic,mechanical,chemical and optical properties, there is a range of applications from coatings for cutting tools to coatings in chips used for cellular telephone transmitters. Electrical ceramics range from passive oxides such as alumina (A12 0 3 ) and silica (Si0 2 ) which are used as substrates and insulators in electronic circuits[ I] to active oxygen ion conducting magnesium oxide (MgO) and Zirconia (ZrO2) which form the basis of high temperature oxygen sensors [2]. Recently, there has been growing interest to use some of these electronics ceramic materials in thin film form as buffer layers to deposit high Tc superconducting oxides on Si substrates [3,4]. These ceramic thin films act not only as diffusion barrier but also provide excellent thermal and lattice match with the substrate materials. Though there are several techniques to grow these ceramic thin films, the technique of laser physical vapor deposition (LPVD) has recently been recognized as a potential method for the synthesis of thin films of composite materials. It has already been shown that LPVD is effective in reproducing the stoichiometry of target exactly in the deposited film[5]. Moreover, this technique offers many process variables such as substrate temperature, type and pressure of ambient, applied bias etc. which can be varied to control the nature of phases and the microstructure of the deposited films. In this paper we report the formation of textured polycrystalline ceramic thin films of yttria-stabilized zirconia(YSZ),MgO,cubic boron nitride (c-BN) and titanium nitride (TiN) on Si (100) substrate using LPVD technique. X-ray diffraction (XRD), and plan and cross section transmission electron microscopy (TEM) were used to study the film quality, texture and the microstructure. the composition and thickness of some of these films were confirmed by Rutherford backscattering spectroscopy (
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