Growth of HfSi x O y / HfO 2 Thin Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposi

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MRS Advances © 2016 Materials Research Society DOI: 10.1557/adv.2016.144

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Downloaded from https://www.cambridge.org/core. Cambridge University Main, on 10 Oct 2018 at 06:07:12, subject to the Cambridge Core terms of use, available at https://www.cambridge.org/core/terms. https://doi.org/10.1557/adv.2016.144