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IN SITU ELLIPSOMETRIC OBSERVATION OF THE GROWTH OF CRYSTALLINE SILICON FROM FLUORINATED PRECURSORS Tetsuya AKASAKA, Yuhzo ARAKI and Isamu SHIMIZU The Graduate School at Nagatsuta, Tokyo Institute of Technology, 4259 Nagatsuta, Midoriku, Yokohama-city Japan 227 ABSTRACT The growth of polycrystalline silicon thin films fabricated from fluorinated precursors SiFnHm (n+m

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