Ion Projection Direct-Structuring For Nanotechnology Applications
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Ion Projection Direct-Structuring For Nanotechnology Applications Hans Loeschnera*, Ernest J. Fantnera, Regina Korntnera, Elmar Platzgummera, Gerhard Stengla, Michaela Zeiningera, J.E.E. Baglinb, Ruediger Bergerc, Wilhelm H. Brüngerd, Andreas Dietzelc, Marie-Isabelle Baratone,f, and Lhadi Merharif a
IMS Nanofabrication GmbH, A-1020 Vienna, Austria
b
IBM Almaden Research Center, San Jose, California, USA
c
IBM Storage Technology Division, Mainz, Germany
d
Fraunhofer Institute for Silicon Technology (ISiT), Itzehoe, Germany
e
UMR6638 CNRS, University of Limoges, France
f
CERAMEC, Limoges, France
ABSTRACT Large-field ion-optics has been developed for reduction printing. Sub-100nm ion projection direct-structuring (IPDS) of patterned magnetic media discs has been demonstrated, extending over 17mm diameter exposure fields, in a single exposure. First results of IPDS patterning of nanocomposite resist material are presented. Information about a novel 200x reduction projection focused ion multi-beam (PROFIB) tool development is provided. Further IPDS nanotechnology applications are discussed. INTRODUCTION In recent years (1997 – 2001), intense efforts have been conducted by International SEMATECH to find the best option for sub-100nm lithography. The ISMT target for NGL (Next Generation Lithography), initially set at 100nm, has steadily been pushed to smaller dimensions due to the continued success of optical lithography. With 193nm water immersion lithography there seems to be the possibility to push device production to the 65nm level and possibly even below, by implementing sophisticated resolution enhancement techniques. Beyond these photolithographic limits, mask-less lithography (ML2) becomes an important option for low and medium volume device fabrication. ML2 finds increased interest of the semiconductor industry facing first production year mask costs for critical levels of 150k$ (50nm-node), with anticipated mask delivery times of >100 days. The first production year is most significant with device design and shrinking being more and more accelerated. For devices with sub-50nm features, NEMS (nano-electro-mechanical systems), nanophotonics, nano-magnetics, molecular nanotechnology devices, etc., novel and even revolutionary fabrication methods will turn out to be mandatory. Traditional lithography is only a fraction of a large variety of nanostructuring possibilities. Ideally, a new paradigm is required, to overcome the interference limitations inherent in optical lithography, and the impracticability of *
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serial e-beam writing as a production tool. The target of this paper is to point out that ion projection direct-structuring (IPDS) is a promising technique to fulfill these ambitious goals, being inherently free from limitations of optical interference. In section 2 IPDS principles will be described, while the functioning 4x-reduction, 17.5mm∅-field IPDS prototype system is shown in section 3. IPDS app
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