Magneto-Optic Materials for Integrated Applications
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G4.6.1
Conf No: 60470 MAGNETO-OPTIC MATERIALS FOR INTEGRATED APPLICATIONS SANG-YEOB SUNG, NA-HYOUNG KIM, and BETHANIE J. H STADLER
ABSTRACT All of the materials necessary for integrated isolators were grown and the application of 2D photonic crystal structures to isolators has been explored. Magnetooptical garnets were grown monolithically by reactive rf sputtering. MgO was used as a substrate because it will useful for future buffer layers and optical claddings. The chemical, structural, and optical properties of the resulting films were analyzed. In order to incorporate photonic crystal structures into the magneto-optic integration scheme, we have calculated a range of radii and spacings necessary to fabricate YIG/air structures with 2D photonic bandgaps using an advanced plane-wave expansion technique. Selfassembled alumina nanostructures have been grown with similar symmetries as those calculated, namely hexagonal close-packed pores. These nanostructures were grown onto semiconductor and oxide substrates in order to demonstrate their use as RIE masks in fabricating photonic crystals. The nanostructures can also be transferred into YIG using separate alumina masks. However, the actual structures grown in this work were smaller than those required for telecommunications due to power supply limitations. For biasing the magneto-optical elements, sputtering was used to monolithically integrate permanent SmCo magnet films using semiconductor-friendly processing. These magnets were sufficient for biasing our magneto-optical waveguides. The chemical, structural and magnetic properties of these materials, as well as total integration with SiO2 cladding layers were analyzed. INTRODUCTION Bulk isolators are very important components in fiber optic systems because they protect light sources from back-reflected light. Integrating isolators with optical source platforms promises to reduce the size and cost of the total source module. Such integration is also critical to the realization of photonics integrated circuits. The active materials for these isolators are magneto-optical garnets, such as yttrium iron garnet (YIG). The currently used YIG fabrication method is liquid phase epitaxy (LPE) [1]. Due to high temperature and epitaxial substrate requirements, this method is not friendly to semiconductor substrates. Therefore to fabricate YIG onto semiconductors, we need a semiconductor friendly growth method such as reactive RF sputtering. MgO was used as substrate, since MgO has been proven to be a good buffer layer and YIG has been successfully grown on it [2,3]. Most magneto-optical garnets require biasing via a permanent magnet. For an integrated permanent magnet layer, SmCo was used. SmCo has a relatively high coercivity, remanent magnetization, and Curie temperature compared with other thin magnetic materials [4]. The substrate for our SmCo films was a fused quartz because silica serves as a good optical cladding for the YIG [2] and also for an underlayer for SmCo.
G4.6.2
In order to optimize chip real estate, 2D ph
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