Microstructure and Hydrogen Absorption/Desorption Behavior of Nanoporous Pd Thin Films
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1098-HH02-08
Microstructure and Hydrogen Absorption/Desorption Behavior of Nanoporous Pd Thin Films Wen-Chung Li, Simone C. Schendel, and T. John Balk Chemical and Materials Engineering, University of Kentucky, 177 F. Paul Anderson Tower, Lexington, KY, 40506-0046 ABSTRACT Nanoporous Pd (np-Pd) prepared from Pd-Ni alloy films on Si substrates was studied to understand hydriding/dehydriding processes in nanoscale Pd. Porous structures of the np-Pd thin films can be changed under different dealloying conditions. Stress measurement of the np-Pd showed that the np-Pd thin films can survive hydrogen pressures from 0 to 1 atm with no blistering, although this problem often occurs in dense Pd films in actual, high-pressure hydrogen environments. These tests indicated that hydrogen atoms can be stored in the np-Pd for much longer times than in fully dense Pd films subjected to ambient conditions. It is proposed that the stress distribution in np-Pd and the small pore size (
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