Nanometrology and super-resolution imaging with DNA
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troduction Nanotechnology research has dramatically fueled the exploration of novel materials with unprecedented properties. However, thus far, few products have bridged the “Valley of Death” from laboratory innovation to industrial integration.1,2 According to the US National Nanotechnology Initiative (NNI): Sustainable Nanomanufacturing—Creating the Industries of the Future,3 “two thrust areas in materials design and measurement technology will support product, tool, and process design informed by and adhering to the overall constraints of scalability.” The first thrust area is scalable design and manufacturing of nanomaterials, and the second is nanometrology. DNA nanotechnology is well positioned to integrate both areas, while also addressing their respective challenges by leveraging concepts in materials science and engineering, such as the ability to exploit Watson–Crick base pairing, where nucleobases pair as guanine–cytosine or adenine– thymine to program the structure–property relationships of DNA nanostructures. The rational integration of next-generation metrology with nanomaterials is a key moment for the NNI, a critical roadblock for the semiconductor industry, and an open invitation for materials scientists and engineers to apply their mantra of characterizing the structure, properties, processing, and
performance of material systems. With the declared end of the International Technology Roadmap for Semiconductor and the recent emergence of the Semiconductor Synthetic Biology Roadmap,4 a new materials ecosystem is under way. The ecosystem includes (1) nucleic acid memory for archival storage, (2) computational systems that are either cell-based or cellinspired, (3) intelligent sensor systems, (4) biological system design, and (5) DNA-controlled sub-10 nm manufacturing.4 In all of these research and technology areas, nanometrology is required. The developments of DNA nanotechnology over the past 30+ years5 provide intriguing possibilities for integrating nanoscale structure and function with next-generation metrology by design. As a technical framework for materials scientists and engineers, there are three applications spaces where the integration of DNA nanotechnology and metrology are being explored in anticipation of this new materials world: (1) DNA nanostructures with arbitrary shapes and features can be synthesized with high yield and may serve as calibration standards for scanning probe microscopy (SPM); (2) dynamic DNA nanotechnology enables a programmable version of superresolution microscopy that, when combined with structural DNA nanotechnology, enables calibration standards for existing and novel super-resolution microscopies; and (3) incorporation of
Elton Graugnard, Micron School of Materials Science & Engineering, Boise State University, USA; [email protected] William L. Hughes, Micron School of Materials Science & Engineering, Boise State University, USA; [email protected] Ralf Jungmann, Ludwig Maximilian University Munich, Max Planck Institute of Biochemistry, Germ
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