Optoelectronic properties of ZnO thin films grown by radio frequency magnetron sputtering
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Optoelectronic properties of ZnO thin films grown by radio frequency magnetron sputtering Saaˆd Rahmane1,* 1 2
and Mohamed Abdou Djouadi2
Laboratoire de Physique des Couches Minces et Applications, Université de Biskra, BP 145 RP, 07000 Biskra, Algeria Institut des Matériaux Jean Rouxel IMN UMR 6502, Université de Nantes, BP 32229, 2 rue de la Houssinière, 44322 Nantes Cedex, France
Received: 7 June 2020
ABSTRACT
Accepted: 25 August 2020
In the present work, Zinc oxide (ZnO) thin films with suitable optoelectronic properties required for application as transparent electrodes have been grown successfully on glass and silicon substrates by radio frequency magnetron sputtering technique at room temperature. A systematic study of the effect of film thickness on optical, electrical, and structural properties of the films was carried out by spectrophotometer, four-point probe, X-ray diffraction, and highresolution transmission electron microscopy (HRTEM). It is observed that the film growth rate increases with increasing film thickness. The obtained ZnO films not only have an average transmittance greater than 90% in the visible region but also have low resistivity (q = 4 9 10- 2 X cm). All the deposited films are polycrystalline with a wurtzite structure and highly textured along the c-axis perpendicular to the substrate surface. As the film thickness increases, the intrinsic compressive stress decreases.
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Springer Science+Business
Media, LLC, part of Springer Nature 2020
1 Introduction Zinc oxide (ZnO) is an II–VI compound semiconductor material with a wurtzite structure and wide direct band gap (C 3.1 eV). Due to its important properties including high transparency, low electrical resistivity, good thermal stability in hydrogen plasma environment, and non-toxicity, the zinc oxide is a promising material for a wide range of applications in a variety of optoelectronic devices like solar cells [1–3], light-emitting diodes (LEDs) [4–6], transparent electrodes for flat panel displays [7, 8], and gas sensors [9–11]. For solar cells and flat panel displays
applications, a transparent conducting oxide (TCO) is a necessary component. The most commonly used TCO’s are tin oxides and indium tin oxide (ITO) due to their outstanding characteristics of high optical transmittance and high electrical conductivity. However, the toxicity of indium element as well as the high cost and scarce has greatly limited its practical applications in the above fields. In view of the depletion of ITO, zinc oxide (ZnO) is the most promising alternative candidate, since the zinc and oxygen elements are practically costless and available; moreover, its transparency and resistivity are comparable to ITO’s.
Address correspondence to E-mail: [email protected]; [email protected]
https://doi.org/10.1007/s10854-020-04340-4
J Mater Sci: Mater Electron
Many deposition techniques such as sputtering [12], plasma-enhanced chemical vapor deposition (PECVD) [13], pulsed laser deposition [14], sol–gel [15], and spray pyrolysis [16, 17] have
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