A Finite Energy Bandwidth-Based Diffraction Simulation Framework for Thermal Processing Applications
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https://doi.org/10.1007/s11837-020-04443-7 Ó 2020 The Minerals, Metals & Materials Society
MESOSCALE MATERIALS SCIENCE
A Finite Energy Bandwidth-Based Diffraction Simulation Framework for Thermal Processing Applications DARREN C. PAGAN ,1,5 KEVONTREZ K. JONES,2 JOEL V. BERNIER,3 and THIEN Q. PHAN4 1.—Pennsylvania State University, University Park, PA 16802, USA. 2.—Northwestern University, Evanston, IL 60208, USA. 3.—Lawrence Livermore National Laboratory, Livermore, CA 94551, USA. 4.—National Institute of Standards and Technology, Gaithersburg, MD 20899, USA. 5.—e-mail: [email protected]
We present a novel finite energy bandwidth-based diffraction simulation framework to aid the analysis of x-ray diffraction patterns gathered during in situ advanced manufacturing processes. The framework generates two-dimensional diffraction patterns that simulate the effects of x-ray energy distributions typical of monochromating optics, and uses microstructure and temperature fields from thermal processing simulations as input. As a demonstration of the capabilities of the framework, we model diffraction associated with selective laser melting of the nickel-based superalloy Inconel 625, employing a finite element thermal model for the input. The simulated diffraction patterns correspond to material volumes exhibiting large temperature gradients consistent with complex thermal processing environments, and we illustrate their utility for interpreting in situ data.
INTRODUCTION The past 10–15 years have seen an unprecedented increase in new alloy manufacturing processes (including rapid thermal processing and additive manufacturing) which take advantage of complex thermal processing routes to obtain new material properties, graded microstructures, and simultaneous component and material creation. These processes entail a large number of parameters (e.g., maximum temperatures, heating rates, cooling rates, hold times) that must be tuned to achieve target performance goals. An empirical, trial-anderror approach continues to guide parameter optimization, which is, not unexpectedly, time-consuming and expensive. One means to accelerate the determination of ideal processing parameters is to develop in situ monitoring capabilities. With this in mind, new synchrotron x-ray capabilities have been developed to gather the requisite data. Specifically, there has been a dramatic expansion of synchrotron-based probes for studying advanced manufacturing processes, particularly additive (Received July 29, 2020; accepted October 6, 2020)
manufacturing (AM).1–10 Diffraction measurements performed in situ can provide a picture of true material state within engineering alloys during processing, allowing manufacturing process simulations to be rapidly tuned to improve accuracy and accelerate reaching target material performance and component qualification goals. These diffraction measurements during alloy processing have been made possible by: (1) bright, highenergy x-ray beams capable of penetrating through mm of material, (2) two-dimensional (2-D
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