A study on the characteristics of plasma polymer thin film with controlled nitrogen flow rate
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NANO EXPRESS
Open Access
A study on the characteristics of plasma polymer thin film with controlled nitrogen flow rate Sang-Jin Cho and Jin-Hyo Boo*
Abstract Nitrogen-doped thiophene plasma polymer [N-ThioPP] thin films were deposited by radio frequency (13.56 MHz) plasma-enhanced chemical vapor deposition method. Thiophene was used as organic precursor (carbon source) with hydrogen gas as the precursor bubbler gas. Additionally, nitrogen gas [N2] was used as nitrogen dopant. Furthermore, additional argon was used as a carrier gas. The as-grown polymerized thin films were analyzed using ellipsometry, Fourier-transform infrared [FT-IR] spectroscopy, Raman spectroscopy, and water contact angle measurement. The ellipsometry results showed the refractive index change of the N-ThioPP film. The FT-IR spectra showed that the N-ThioPP films were completely fragmented and polymerized from thiophene. Keywords: PECVD, plasma polymer, N-ThioPP, optical, physical, and chemical properties
Introduction The existing semiconductor technology lets a silicone material make integrations by a top-down form developed by nano- or molecule technology merged with nanotechnology, biotechniques, and information technology and by a bottom-up method to constitute a device and a circuit with self-alignment of atoms and molecules. Those are common opinions of a majority of experts. In spite of the basic consensus by such experts, the progress in the nano and molecule device research field is very slow, and it is much worse now. There are many causes as possible reasons, but it is recognized that the following are still in question: ‘the choice of the stable molecule and design technology,’ ‘self-alignment technology of atoms and molecules,’ and ‘technology to form a molecule and contact between the metal electrode for stability’ [1,2]. The realization of nanoscale electronics expects the development of bottom-up strategies such as chemical synthesis, self alignment of atoms and molecules, and self-assembled supramolecule. In fabricating the bio-application material, the diamond-like carbon [DLC] films have been a good candidate for some applications such as blood-contacting devices [3] and cell-contacting materials [4] due to their excellent mechanical properties [5-7].
* Correspondence: [email protected] Department of Chemistry and Institute of Basic Science, Sungkyunkwan University, Suwon 440-746, South Korea
In this work, nitrogen-doped plasma polymer was deposited by nitrogen injection during the plasmaenhanced chemical vapor deposition [PECVD] process without ammonia gas. Also, N-ThioPP thin films were investigated on the surface properties such as surface energy and structural effects. Experimental detail
The experiment was carried out in a homemade stainlesssteel PECVD system as shown in Figure 1. Silicon(100) wafers were wet-cleaned by sonication with acetone, ethyl alcohol, distilled water, and isopropyl alcohol and dried by N2 gas blowing. Also, substrates were dry-cleaned by in situ Ar plasma bombardment with 100 W for 15 min. The
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