Novel laser micro-texturing on silicon with liquid lenses by breath figure method
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TECHNICAL PAPER
Novel laser micro-texturing on silicon with liquid lenses by breath figure method Yuan-Jen Chang1
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Yong-Xiang Chang1
Received: 4 September 2020 / Accepted: 22 September 2020 Ó Springer-Verlag GmbH Germany, part of Springer Nature 2020
Abstract Surface texturing is a way of managing the surface properties of a material. This paper adopts a novel approach to laser texturing by using it in conjunction with liquid glycerin lenses and a polymer template. Such a process can effectively be used to produce micro- or even nano-scale textures on complex three-dimensional surfaces. A polymer film with an array of glycerin–water-mixed droplets proved economical and easy to produce. The resulting liquid lenses were penetrated by a nanosecond pulsed Nd:YAG laser. As the laser beam passed through the liquid lens array, it was refocused and converted to multiple beams that all engineered the substrate surface. The surface was thus successfully textured. The adaptation laser texturing technology shows potential for the application of textures to complex three-dimensional objects. In this study, a large area of microscale surface texturing on a silicon substrate was demonstrated; the texturing size lay between 1 and 3 lm, and the depth of the texturing was around 20 nm.
1 Introduction Surface texturing is an engineering approach to managing the surface properties of a material. Due to the long-term stability of its structures, surface texturing technologies maintain properties of a modified surface that can sustain harsh environments, such as the engines of automobiles (Vlaˇdescu et al. 2019), engines of airplanes (Zhang and Bijay 2018), or the surfaces of cutting tools (Niketh and Samuel 2017). Multi-scale textures, as inspired by Mother Nature, can also be applied depending on its applications; currently scales range from millimeters to micrometers or even nanometers. Millimeter or tens-of-micrometer scale texturing can be relatively easily achieved by mechanical machining, electrical discharge machining (EDM), or laser material processing. However, several micrometer or nanometer scale texturing cannot be so easily achieved. Several emergent technologies, such as photolithography, nanoimprint technology, EDM, or laser micro/nano-fabrication techniques, have been developed for this purpose. Conventional semiconductor photolithography or & Yuan-Jen Chang [email protected] 1
Department of Mechanical Engineering, National Yunlin University of Science Technology, No. 123, Sec. 3, University Rd., Douliou 640, Yunlin, Taiwan
nanoimprint technology has been well-developed over the past decades to a point where feature sizes below 10 nm can now be achieved. The principal advantages of these techniques are their precise controls over the feature size and positions of markings; however, planar substrates with ultralow roughness and flatness are required in texture formations (Senn et al. 2011). Moreover, the materials on which such techniques can be employed are also l
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