Spring Meeting Grows
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The Second Annual Spring Meeting of the Materials Research Society, to be held April 15-18 in San Francisco, will feature more than twice as many symposia as the inaugural meeting last spring in Albuquerque. This is a response to the remarkably enthusiastic reception accorded the first Spring Meeting, where attendance was nearly double the anticipated number of participants.
K.C. Jungling, J.K. Mclver, and J.R. McNeil, all of the University of New Mexico.
Meeting Chairpersons Chairing the meeting are three outstanding materials scientists. They are A. Wayne Johnson, Sandia National Laboratories; Susan M. Kelso, Xerox Corporation, Palo Alto Research Center, and K.S. Sree-Harsha, San Jose State University. They report their program has been organized on the themes of the materials properties of thin films and on electronic materials. One, on mass memory technologies, grows out of the Albuquerque meeting. The others are new. The Society anticipates the blending of topics will inspire cross-symposia interest among participants while delving with the usual MRS depth into the nuts-andbolts of the individual subjects.
Two major conferences annually Expand the available offerings while Permitting greater convenience and flexibility
Eight Symposia Slated Offered at San Francisco will be what promise to be eight outstanding symposia, each authoritatively organized. They are: • "Ion Beam Processes in Advanced Electronic Materials and Device Technology," chaired by F.H. Eisen, Rockwell, B.R. Appleton, Oak Ridge, and T. Sigmon, Stanford. • "Microscopic Identification of Electronic Defects in Semiconductors," chaired by N.M. Johnson, Xerox Palo Alto, Steve Bishop, NRL, and G. Watkins, Lehigh University. • "Thin Films: The Relationship of Structures to Properties," chaired by K.S. Sree-Harsha, San Jose State, and C. Aita, University of Wisconsin/Milwaukee. • "Mass Memory Technologies," chaired by M.A. Bosch, AT&T Bell Laboratories. • "Applied Materials Characterization," chaired by W. Katz, General Electric, and Peter Williams, Arizona State University. • "Materials Issues in Applications of Amorphous Silicon Technology," chaired by A. Madan, SERI, M.J. Thompson, Xerox Palo Alto, and David Adler, MIT. • "XUV and X-ray Optics for Synchrotron Radiation," chaired by P.A. Pianetta, SLAC-Stanford, and J. Golovchenko, AT&T Bell Laboratories. • "High-Power Dielectric Optical Mirrors," chaired by
Purpose of Spring Meetings The decision to sponsor two major international meetings annually was made by the Society for several reasons. The
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phenomenal growth in attendance at the Annual Meeting, held in the fall, resulted in symposia so overcrowded that the talks couldn't be fully appreciated. That meeting's East Coast location, also, was inconvenient for many West Coast and Asian participants. Further, the opportunity to repeat symposia after 18 months, rather than 12 or 24, made a Spring Meeting on the West Coast a valuable option for MRS members. The happy result has been that 500 materials professionals—nearly a third the number w
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