Supercritical CO 2 extraction of porogen phase: An alternative route to nanoporous dielectrics
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B. Lahlouh, T. Rajagopalan, and N. Biswas Physics Department, Texas Tech University, Lubbock, Texas 79409
J. Sun, D.H. Huang, and S.L. Simon Chemical Engineering Department, Texas Tech University, Lubbock, Texas 79409
A. Mallikarjunan Center for Integrated Electronics, Rensselaer Polytechnic Institute, Troy, New York 12180
H-C. Kim, J. Hedstrom, W. Volksen, and R.D. Miller IBM Almaden Research Center, San Jose, California 95120
M.F. Toney SSRL, Stanford Linear Accelerator Center, Menlo Park, California 94025 (Received 6 April 2004; accepted 12 July 2004)
We present a supercritical CO2 (SCCO2) process for the preparation of nanoporous organosilicate thin films for ultralow dielectric constant materials. The porous structure was generated by SCCO2 extraction of a sacrificial poly(propylene glycol) (PPG) from a nanohybrid film, where the nanoscopic domains of PPG porogen are entrapped within the crosslinked poly(methylsilsesquioxane) (PMSSQ) matrix. As a comparison, porous structures generated by both the usual thermal decomposition (at approximately 450 °C) and by a SCCO2 process for 25 and 55 wt% porogen loadings were evaluated. It is found that the SCCO2 process is effective in removing the porogen phase at relatively low temperatures (
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