Synthesis of TiN and TiO 2 thin films by cathodic cage plasma deposition: a brief review
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(2020) 42:496
REVIEW
Synthesis of TiN and TiO2 thin films by cathodic cage plasma deposition: a brief review L. H. P. Abreu1 · M. Naeem2 · W. F. A. Borges1,3 · R. M. Monção4 · R. R. M. Sousa1 · M. Abrar5 · Javed Iqbal6,7 Received: 21 November 2019 / Accepted: 13 August 2020 © The Brazilian Society of Mechanical Sciences and Engineering 2020
Abstract The cathodic cage plasma deposition (CCPD) is an advanced technique recently developed from an active screen plasma nitriding system, which has been used for thin film deposition such as titanium nitride and titanium dioxide (TiO2). These coatings can improve the physical, mechanical, and optical properties of numerous materials, and such coatings can be developed by several techniques. Unfortunately, the conventional deposition techniques exhibit certain drawbacks, including high cost, the complexity of the operation, very low pressure, and high processing temperature; as a result, CCPD is an advantageous technique. In this review, brief information on the deposition of titanium nitride and oxide coatings on steel alloys, titanium, glass, and silicon substrates, and the effect of control parameters on deposition efficiency is provided. The effectiveness of this system for the synthesis of thin films on various substrates, including insulators and conductors, is also summarized. The recent developments and applications of CCPD for titanium-based coatings are described in detail. Keywords Plasma · Nitriding · Micro-hardness · Wear · Coatings · Corrosion · CCPD · Films
1 Introduction
Technical Editor: Izabel Fernanda Machado, Dr. * M. Naeem [email protected]; [email protected] 1
Graduate Program in Materials Engineering and Science, Technology Center, Federal University of Piauí, Universitária Ave., Ininga, Teresina, PI 64049‑550, Brazil
2
Department of Physics, Women University of Azad Jammu and Kashmir, Bagh, Pakistan
3
Graduate Program in Mechanical Engineering, Federal University of Pernambuco, Arquitetura Ave., Cidade Universitária, Recife, PE 50740‑550, Brazil
4
Department of Mechanical Engineering, Technology Center, Federal University of Piauí, Universitária Ave., Ininga, Teresina, PI 64049‑550, Brazil
5
Department of Physics, Hazara University Mansehra, Abbotabad, Pakistan
6
Department of Physics, University of Azad Jammu and Kashmir, Muzaffarabad, Pakistan
7
INRS-Energy, Material Telecommunications Research Centre, Varennes, QC, Canada
Titanium nitride (TiN) and titanium dioxide (TiO2) thin films have received much attention throughout the world due to their numerous applications in different fields [1, 2]. Titanium nitride coatings are used in many industrial applications, such as in the metallurgical industry for high hardness and low friction [3] and in decorative coatings to replace gold, as different shades of color may be obtained by the variation of the Ti/N ratio [4]. This material is also used in optical applications such as solar cell coatings and solar control windows [5] and biocompatible alloy coatings
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