Correction to: XUV laser mass spectrometry for nano-scale 3D elemental profiling of functional thin films
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CORRECTION
Correction to: XUV laser mass spectrometry for nano‑scale 3D elemental profiling of functional thin films D. Bleiner1,2 · M. Trottmann1 · A. Cabas‑Vidani3 · A. Wichser1 · Y. E. Romanyuk3 · A. N. Tiwari3
© Springer-Verlag GmbH Germany, part of Springer Nature 2020
Correction to: Applied Physics A (2020) 126:230 https://doi.org/10.1007/s00339-020-3381-3
Computer Engineering at Colorado State University and Pacific Northwest National Laboratory.
In the original article, one of the texts was missing in the Acknowledgment section. It should read as follows: Acknowledgements The authors acknowledge Prof. J. J. Rocca and Prof. C. S. Menoni (Colorado State University) for the original proof-of-principle of the Argon capillary discharge laser (now operative in our laboratory) on our own samples. The research was exclusively funded internally at Empa by the two laboratory involved, as explorative project on instrumentation R&D. XUV TOF was operated by Lydia Rush, graduate student in the Department of Electrical and
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The original article can be found online at https://doi.org/10.1007/ s00339-020-3381-3. * D. Bleiner [email protected] 1
Laboratory for Advanced Analytical Technologies (Empa Materials Science and Technology), Überlandstrasse 129, 8600 Dübendorf, Switzerland
2
Department of Chemistry, University of Zurich, Winterthurerstrasse 190, 8057 Zurich, Switzerland
3
Laboratory for Thin Films and Photovoltaics (Empa Materials Science and Technology), Überlandstrasse 129, 8600 Dübendorf, Switzerland
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