Effect of Al-content and Post Deposition Annealing on the Electrical Properties of Ultra-thin HfAl x O y Layers | IBOOK.PUB

Effect of Al-content and Post Deposition Annealing on the Electrical Properties of Ultra-thin HfAl x O y Layers

PDF / 1,439,566 Bytes
6 Pages / 612 x 792 pts (letter) Page_size
60 Downloads / 211 Views

Data Loading...

Recommend Documents

Impact of Post Deposition Annealing on Characteristics of Hf x Zr 1 - x O 2

190 5 441KB

Structural, Microstructural, Electrical, and Magnetic Properties of CuFe 2-(x+y) Eu x Sc y O 4 (where x and y vary from

199 81 5MB

Effects of Post-Deposition Annealing Temperature on Band Alignment and Electrical Characteristics of Lanthanum Cerium Ox

185 66 844KB

Effect of fast annealing on the electrical properties of SiO 2 /Si structures with thin layers of anodic silicon oxide

181 111 167KB

The effect of annealing temperature on the structural, optical, and electrical properties of CdS films

252 12 940KB

Electrical Properties of Schottky Contacts of TiW on RTCVD Si 1-x-y Ge x C y Films

212 7 374KB

APCVD SiC x O y Deposition as Na Barrier Layers for TCO/Low-E Glass Coatings

262 6 1MB

Effect of Growth Conditions on Structural and Electrical Properties of Pb(Zr x Ti 1-x )O 3 layers grown by peroxide MBE

150 113 948KB

Effect of Hot Band Annealing on the Microstructure and Mechanical Properties of Low Carbon Electrical Steels

207 32 271KB

Influence of Post-Deposition Annealing on Lattice Strain, Electrical Transport and Magnetic Properties in Epitaxial La 0

137 34 389KB

Wet Oxidation of Si 1-x-y Ge x C y Layers on (100) Si

188 47 1MB

Thermal Annealing Effect on the Thermal and Electrical Properties of Organic Semiconductor Thin Films

186 36 427KB