Fabrication of Integrated Magneto-Optic Isolator
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FABRICATION OF INTEGRATED MAGNETO-OPTIC ISOLATOR Sang-Yeob Sung, Xiaoyuan Qi, John Reinke, Samir K. Mondal, Sun Sook Lee, and Bethanie J. H Stadler Electrical and Computer Engineering, University of Minnesota, Minneapolis, MN 55455
ABSTRACT In optical applications, especially in optical communications, protecting light sources from harmful reflected energy is very important. With magneto-optic isolators, these light sources can be protected to extend their lifetimes and performance by blocking back-reflected light. The active element in these optical isolators is a magneto-optical garnet. However, garnet is difficult to integrate with semiconductors due to the high thermal budget usually required to obtain the garnet crystal structure. For example, current isolator garnets cannot be integrated monolithically into a photonic integrated circuit due to the growth process, liquid phase epitaxy, which requires growth temperatures of >900 °C and also garnet substrates. In this work, magneto-optical garnets were grown monolithically by low-temperature reactive RF sputtering, followed by an ultra-short (
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