Formation of Insulating Oxide Films with Hydrolysis Reactions of Alkoxide Precursors in Supercritical Fluid CO 2 : Chemi
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Formation of Insulating Oxide Films with Hydrolysis Reactions of Alkoxide Precursors in Supercritical Fluid CO2: Chemistry, Morphology, Characterization and Film Thickness Joanna S. Wang, Chien. M. Wai, Gail J. Brown, Scott D. Apt, Howard E. Smith and Laraba P. Kendig MRS Advances / FirstView Article / June 2016, pp 1 - 6 DOI: 10.1557/adv.2016.269, Published online: 19 April 2016
Link to this article: http://journals.cambridge.org/abstract_S2059852116002693 How to cite this article: Joanna S. Wang, Chien. M. Wai, Gail J. Brown, Scott D. Apt, Howard E. Smith and Laraba P. Kendig Formation of Insulating Oxide Films with Hydrolysis Reactions of Alkoxide Precursors in Supercritical Fluid CO2: Chemistry, Morphology, Characterization and Film Thickness. MRS Advances, Available on CJO 2016 doi:10.1557/adv.2016.269 Request Permissions : Click here
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MRS Advances © 2016 Materials Research Society DOI: 10.1557/adv.2016.269
Formation of Insulating Oxide Films with Hydrolysis Reactions of Alkoxide Precursors in Supercritical Fluid CO2: Chemistry, Morphology, Characterization and Film Thickness Joanna S. Wang,1 Chien. M. Wai,2 Gail J. Brown,1 Scott D. Apt,1 Howard E. Smith,1 Laraba P. Kendig1 1
Air Force Research Laboratory, Materials & Manufacturing Directorate, Wright-Patterson
AFB, OH 45433-7707, USA 2
Department of Chemistry, University of Idaho, Moscow, ID 83844, USA
ABSTRACT Insulating silicon dioxide (SiO2) films can be produced by hydrolysis of metal alkoxide tetraethylorthosilicate (TEOS) in the presence of an acid catalyst in supercritical fluid CO2 (scCO2). In this study, SiO2 films are formed on different substrates using TEOS as a source of silicon, and acetic acid (HAc) as a catalyst. Water required for the hydrolysis reaction is from in situ generation of esterification and condensation reactions involving HAc and the alcohol produced. The acid catalyzed deposition reaction actually starts at room temperature but produces decent films in sc-CO2 at moderately high temperatures (e.g. 50 oC). Supercritical fluid CO2 is known to have near zero surface tension and provides an ideal medium for fabrication of SiO2 films. Formation of SiO2 films via hydrolysis reaction in sc-CO2 is more rapid compared to the traditional hydrolysis reaction at room temperature. In general, metal alkoxide hydrolysis reactions carried out in a closed sc-CO2 system is not affected by moisture in air compared with traditional open-air hydrolysis systems. Using sc-CO2 as a reaction medium can eliminate undesirable organic solvents utilized in traditional alkoxide hydrolysis reactions. X-ray diffraction (XRD) and electron diffraction (ED) measurements demonstrated that the SiO2 films produced are amorphous. Energy dispersive spectroscopy (EDS), attenuated total reflectance-Fourier transform infrared (ATR-FTIR) and X-ray photoel
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