Inorganic-Organic Composites (Ormocers) as Structured Layers for Microelectronics
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INORGANIC-ORGANIC COMPOSITES (ORMOCERs) AS STRUCTURED LAYERS FOR MICROELECTRONICS MICHAEL, POPALL , HENNING MEYER , HELMUT SCHMIDT , JOCHEN SCHULZ *Fraunhofer-Institut fur Silicatforschung, Neunerplatz 2, D-8700 Wurzburg, F.R.G. **Institut fur Neue Materialien der Universitat Saarbrucken, Im Stadtwald, Gebaude 43, D-6600 Saarbrucken, F.R.G. ABSTRACT Enhanced integration, faster signal transmission and reduced size of mounting devices in components for microelectronics requires new patternable materials. Inorganic-organic copolymers (ORMOCERs a ORganically MOdified CERamics), prepared by sol-gel techniques have been developed for interconnection technologies in microelectronics. Photopolymerization is enabled by unsaturated hydrocarbon or epoxide substituents and UV-sensitive initiators. Using a frequency doubled Argonion laser at 257 nm for direct laser writing, patterned layers with high edge quality have been realized. In combination with high breakthrough voltages, low permittivity constants and high bulk resistivities they open interesting aspects for very large system integration techniques (VLSI). INTRODUCTION The potential of new generations of ram and rom chips, especially processors, cannot be fully utilized without enhanced integration and multilayer technology [1]. Therefore microelectronics requires tailormade materials and new techniques for interconnection. Multilayer technology demands patternable dielectric materials with especially high electrical resistivity for high density of conducting paths, low permittivity constants for minimum signal deformation and good adhesion to substrate material and to active and passive components. At the present state of the art dielectric materials like polyimide or polyimide/polyamide blends are well established [2]. For higher integration, however, the permittivity constant should be as low as possible, and water take up has to be minimized. As shown in [3], ORMOCERs could be synthesized with low E values, good adhesion to substrates like aluminum, extremely low H 0 take up and curing temperatures as low as 280 *C. In [4] ihe possibility of the development of photolithographic patterns was investigated and it was shown, that ORMOCERs with polymerizable groups can be patterned. The objective of the present investigation was to develop ORMOCERs able to be patterned by direct laser writing techniques. This technique provides a flexible tool for microelectronic design. Therefore several types of ORMOCERs have been synthesized and tested for direct laser writing.
Mat. Res. Soc. Symp. Proc. Vol. 180. ©1990 Materials Research Society
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EXPERIMENTAL Three compositions have been developed: I: 0.45 mol 3-methacryloxypropyltrimethoxysilane, 0.30 mol phenyltrimethoxysilane, 0.25 mol aluminiumtri-sec.-butylate II: 0.39 mol 3-(glycidoxypropyl)trimethoxysilane, 0.39 mol 3-methacryloxypropyltrimethoxysilane, 0.18 mol vinyltrimethoxysilane, 0.04 mol tetraethoxysilane. III: 0.39 mol 3-(glycidoxypropyl)trimethoxysilane, 0.39 mol 3-methacryloxypropyltrimethoxysilane, 0.18 mol
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