On the reproducibility of spray-coated ZnO thin-film transistors
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MRS Advances © 2020 Materials Research Society DOI: 10.1557/adv.2020.199
On the reproducibility of spray-coated ZnO thin-film transistors Guilherme R. Lima1, João P. Braga1, Giovani Gozzi2, Lucas Fugikawa-Santos2 Physics Department/IBILCE, – São Paulo State University-UNESP, São José Do Rio Preto, SP 15054 ‑ 000, Brazil 1
2 Physics Department/IGCE, – São Paulo State University-UNESP, Av. 24A, 1515, Rio Claro, SP 13506 ‑ 900, Brazil
Abstract: Recent studies have shown spray-pyrolysis is a low-cost, simple and efficient technique for deposition of metal oxide semiconductors (such as zinc oxide) as the active layer of thin-film transistors (TFTs). However, to allow the translation from laboratory scale to industry the reproducibility of such method needs to be evaluated. We present herein a representative study concerning the reproducibility and uniformity of spray-coated ZnO TFTs using several devices, from different production batches, following the same fabrication protocol. We demonstrate that it is possible to obtain transistors with high performance and reproducibility by controlling the most relevant deposition factors, corroborated by a low deviation rate (below 10%) from the characteristic TFT parameters (mobility in saturation, threshold voltage and on/off ratio), which is compatible to commonly available commercial electronic devices.
INTRODUCTION Thin-film transistors (TFT) using transparent semiconducting oxides (TSOs) as the active material exhibit several advantages, including good chemical stability, high charge carrier mobility, high optical transmittance in the visible spectrum and compatibility to flexible substrates [1-4]. Zinc oxide (ZnO) and its related compounds are particularly interesting in innumerous applications [5-7] because they exhibit charge carrier mobility values even higher than amorphous silicon [1,6], present a wide band gap energy (~ 3.37 eV) [8-11], are biocompatible and environmentally friendly materials [12-14], and can be synthesized and processed by simple and low-cost methods. Spraypyrolysis technique is especially advantageous for large-scale and low-cost fabrication when compared to conventional processing techniques, such as RF magnetron sputtering,
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pulsed laser deposition (PLD), atomic layer deposition (ALD), chemical vapor deposition (CVD) and spin-coating [1,15-17]. Although the fabrication of ZnO TFTs by spray-pyrolysis has been reported in current literature [6,19-21], the device performance can be severely affected by several fabrication parameters, presenting high variability of the output parameters and rising concerns about device response reproducibility. We present a systematic study of the reproducibility of the device response parameters and how the control of the spray-pyrolysis deposition factors can lead to good device reproduci
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