Photochemical Metal Organic Deposition of Patterned Nanostructured Oxide Films
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0901-Ra24-02.1
Photochemical Metal Organic Deposition of Patterned Nanostructured Oxide Films Xin Zhang and Ross H. Hill Department of Chemistry, Simon Fraser University, 8888 University Drive, Burnaby, BC, Canada V5A 1S6 ABSTRACT In this paper, we present examples of the use of photochemical metal organic deposition to form nanostructured metal oxide films. In the first example, we use two reactions with very different reaction rates to control the nanostructuring, utilizing tantalum (V) tetraethoxide acetylacetonate (as a thermally reactive source of tantalum oxide) and manganese (II) 2ethylhexanoate (as a photochemically reactive source of manganese oxide). We prepare homogeneous precursor films of tantalum (V) tetraethoxide acetylacetonate and manganese (II) 2-ethylhexanoate and in the dark allow the tantalum complex to react forming tantalum oxide regions. The film is then exposed and the manganese complex is converted to a matrix surrounding the tantalum regions. The resultant structures are characterized by electron microscopy, energy dispersive X-ray spectroscopy and Auger spectroscopy. In the second example, we use two immiscible precursors, zirconium (IV) 2-ethylhexanoate and yttrium nitrate hexahydrate to form nanostructured precursor films. The nanostructuring of these films is apparent from SEM studies. Exposure of these films results in the formation of nanostructured films consisting of a zirconium oxide matrix with encapsulated yttrium oxide. INTRODUCTION In this paper, the latest advances in preparing nanostructured metal oxide films by photochemical metal organic deposition (PMOD) are reported. Photochemical metal organic deposition is method for fabricating metal or metal oxide films [1-2]. In this method (see Figure 1), a solid precursor film containing amorphous photosensitive metal organic complex(s) is first deposited on a substrate. The precursor film is irradiated with a light source through a photo mask converting the exposed regions to metal or metal oxide. Solvent development results in the loss of the non-exposed portion of the precursor film, leaving a patterned film on the substrate. Nanostructured thin films have attracted interest due to their novel properties and potential use in microelectronic devices, catalysts, and sensors. Methods such as Sol-Gel, metal organic chemical vapor deposition (CVD), PMOD, laser ablation, surface anodizing, and reverse micelle techniques have been employed to obtain nanostructured films [3-6]. Among these methods, PMOD is compatible with lithography, making it a very promising tool for direct deposition of patterned films. Previously [5], we prepared CdS nanostructured MnO films by introducing CdS nano-particles, prepared by a reverse micelle method, into a manganese precursor solution and converting the manganese precursor. In this paper, the fabrication of patterned nanostructured hv Photo mask
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Precursor film Substrate
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Figure 1. The preparation of a patterned film by photochemical metal organic deposition
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