APCVD SiC x O y Deposition as Na Barrier Layers for TCO/Low-E Glass Coatings
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APCVD SiCxOy Deposition as Na Barrier Layers for TCO/Low-E Glass Coatings Wei Zhang1, Tom Salagaj1, Christopher Jensen1, Karlheinz Strobl1 and Michael Davies2 1 CVD Equipment Corporation, 1860 Smithtown Ave., Ronkonkoma, NY 11779 2 Sixtron Advanced Materials, 1785 Rte Trans Canada, Dorval (Quebec), Canada H9P 1J1 ABSTRACT We report on the experimental investigation of the use of Sixtron Advanced Materials Silane-free gas generation system to deposit a transparent SiCxOy Na-diffusion barrier and antireflection film (for subsequent TCO thin film coatings) onto glass sheets with an APCVD deposition process. SiCxOy thin films (50-250nm thickness) with a tunable index of 1.65-1.75 are currently being deposited by APCVD On-line float glass coating systems depositing Transparent Conductive Oxide (TCO) coatings (both for Low-E windows and for solar panel manufacturing applications these coatings typically have a refractive index of about 1.9) using, for example, gaseous Silane (SiH4), Propylene or Ethylene and Oxygen. Such a barrier film is critical for achieving high transparency through its anti-reflection properties having an intermediate index, i.e. close to the value of nglass × nTCO to achieve high conductivity for subsequent deposited TCO layers and to improve the longevity of the TCO coating performance through its Na-diffusion barrier properties. The Sixtron’s Silane-free gas generation system uses a solid material as starting source that is safe for shipping by airand thus removes many of the safety and cost concerns involved with handling and exchanging of hazardous Silane gas cylinders at the thin film production site. A successful transfer of this alternative Si-precursor material to the proprietary CVDgCoat™ APCVD coating platform under development by CVD Equipment corporation would enable the manufacturing and operation of safer and lower cost On-line and Off-line APCVD thin film glass coating systems for the fast growing coated glass sheet market driven by the growing alternative energy demand for both energy saving and energy generation materials. INTRODUCTION Both Tin oxide (SnO2) and Zinc oxide (ZnO) thin films have very beneficial properties, such as high electrical conductivity, transparency, and reflective to infrared light, etc., all of which make them suitable for a wide variety of applications [1-5]. For example they are typically be used as a low-E coating on architectural glass to add both the property of reflectivity to infrared radiation and the property of transparency to visible light. Another application of these thin layers is as TCO layer in display LCD panels manufacturing and in photovoltaic cells [6-10]. All these applications require deposition processes capable of producing thin layers with reproducible and precisely defined optical and material properties. Techniques for TCO or lowE thin film deposition include sputtering, evaporation, spray pyrolysis, and chemical vapor deposition. Among them the most cost effective process for large volume (large area) thin film coatin
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